SOLICITATION NOTICE
34 -- ELECTROPLATING SYSTEM
- Notice Date
- 5/9/2002
- Notice Type
- Solicitation Notice
- Contracting Office
- NASA/Glenn Research Center, 21000 Brookpark Road, Cleveland, OH 44135
- ZIP Code
- 44135
- Solicitation Number
- 3-202028
- Response Due
- 5/23/2002
- Archive Date
- 5/9/2003
- Point of Contact
- Nancy M. Shumaker, Purchasing Agent, Phone (216) 433-2133, Fax (216) 433-2480, Email Nancy.M.Shumaker@grc.nasa.gov
- E-Mail Address
-
Email your questions to Nancy M. Shumaker
(Nancy.M.Shumaker@grc.nasa.gov)
- Description
- This notice is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; quotes are being requested and a written solicitation will not be issued. This procurement is being conducted under the Simplified Acquisition Procedures (SAP). Description: A MEMS/IC electroplating system for 3 inch, 4 inch, and wafer pieces. Electrochemical Systems Model IKO or equal. General Specifications: 1. Electroplating system shall be a complete, self-contained system capable, with proper use by NASA GRC technicians trained by the supplier as part of this procurement, of plating Cu, Ni, Au, and other metals onto 3 and 4 inch semiconductor wafers, 2 inch by 2 inch ceramic substrates, and smaller sized pieces of the above materials. 2. The plated metal thickness shall be uniform across the sample to within 10 percent regardless of the feature size, which may be 5 nm to 10 mm, and the location on the substrate. The system shall be capable of plating metals to thicknesses from 0.5 to 25 micron. 3. The system shall be designed to facilitate easy cleaning and switching between different metal plating solutions. 4. Manuals shall be provided. 5. Two days of training at NASA GRC for three NASA GRC technicians shall be provided on the proper use of the system and a demonstration of the system for the plating of Au, Cu, and/or Ni onto substrates prepared and provided by NASA GRC. Acceptance of system will be based on the samples plated during the demonstration at NASA GRC and their characterization on Dektak profilometer. 6. Supplier shall deliver written "recipes" or processes for the plating of Au, Ni, and Cu onto substrates, and the recipes shall be sufficient to yield metal thickness within 20 percent of target thickness within first try. Specific specifications: 1. Input power shall be 120 V, 60 Hz. 2. The power supply shall be a DuPR-10 series (Dynatronix) reverse pulse rectifier or equivalent with 1 A average and 3 A peak current for a voltage between 0 and 10 V. The power supply shall provide regulated forward and reverse DC current and forward and reverse pulsed current. The stability of the current shall be +/- 1 mA with less than 1 percent ripple. The power supply shall be fully programmable with 0 to 10 msec forward/reverse on/off timing. 3. The plating solution shall be circulated by a 24 gal/hr or larger pump with controls to vary the pump rate between 1 gal/hr and the maximum pump rate (1-24 gal/hr) and with 1 micron filters. A minimum of 5 replacement filters shall be included in addition to the filter delivered with the system. 4. The plating solution temperature shall be controlled to within 1 degree C by a 550 W or larger heater. Temperature range shall be from room temperature (65 degree F) to 130 degree F or higher. 5. A reciprocating anode cut for the plating of 3 inch, 4 inch, and wafer pieces. The anode shall be vibrated or reciprocated with a frequency between 0 and 2.5 Hz or greater and the anode shall be constructed from a material that assures regulated, uniform distribution of plating solution and electric field at the surface of the substrate that is being plated. A minimum of 192 square inch of replacement anode material with one side no shorter than 8 inch shall be included in addition to the anode pieces required for the 3 inch, 4 inch, and wafer pieces. 6. A wafer holder or holders shall be provided for 3 inch, 4 inch, and wafer pieces. 7. The electroplating tank shall hold no more than 10 liter of solution and shall be constructed for easy removal and cleaning. 8. System shall have a 2-inch exhaust hood attachment. The provisions and clauses in the RFQ are those in effect through FAC 01-6. This procurement is a total small business set-aside. The NAICS Code and the small business size standard for this procurement are 334417 and 500, respectively. The quoter shall state in their quotation their size status for this procurement. All qualified responsible business sources may submit a quotation which shall be considered by the agency. Delivery shall be FOB Destination. The DPAS rating for this procurement is DO-C9. Quotations for the items described above are due by COB 5-23-02 and may be mailed or faxed to NASA-Glenn Research Center, Attn: Nancy Shumaker, 21000 Brookpark Road, Cleveland, Ohio 44136, FAX: 216-433-2480 and include, solicitation number, FOB destination to this Center, proposed delivery schedule, discount/payment terms, warranty duration (if applicable), taxpayer identification number (TIN), identification of any special commercial terms, and be signed by an authorized company representative. If the end products quoted is other than domestic end products as defined in the clause entitled "Buy American Act -- Supplies," the quoter shall so state and shall list the country of origin. The Representations and Certifications required by FAR 52.2l2-3 may be obtained via the internet at URL: http://ec.msfc.nasa.gov/msfc/pub/reps_certs/sats/ The FAR may be obtained via the Internet at URL: http://www.arnet.gov/far/ The NFS may be obtained via the Internet at URL: http://www.hq.nasa.gov/office/procurement/regs/nfstoc.htm Award will be based upon overall best value to the Government, with consideration given to the factors of proposed technical merits, price and past performance; other critical requirements (i.e., delivery) if so stated in the RFQ will also be considered. Unless otherwise stated in the solicitation, for selection purposes, technical, price and past performance are essentially equal in importance. It is critical that offerors provide adequate detail to allow evaluation of their offer (see FAR 52.212-1(b). Quoters must provide copies of the provision at 52.212-3, Offeror Representation and Certifications - Commercial Items with their quote. See above for where to obtain copies of the form via the Internet. An ombudsman has been appointed - See NASA Specific Note "B". It is the quoter's responsibility to monitor the following Internet site for the release of amendments (if any): http://prod.nais.nasa.gov/cgi-bin/eps/bizops.cgi?gr=C&pin=22 Potential quoters will be responsible for downloading their own copy of this combination synopsis/solicitation and amendments (if any).
- Web Link
-
Click here for the latest information about this notice
(http://prod.nais.nasa.gov/cgi-bin/eps/bizops.cgi?gr=D&pin=22#101391)
- Record
- SN00074700-W 20020511/020509213410 (fbodaily.com)
- Source
-
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