MODIFICATION
66 -- Photolithographic Mask Aligner System
- Notice Date
- 5/15/2003
- Notice Type
- Modification
- Contracting Office
- Department of the Navy, Office of Naval Research, Naval Research Laboratory, 4555 Overlook Ave. S.W., Washington, DC, 20375
- ZIP Code
- 20375
- Solicitation Number
- N00173-03-R-MS03
- Response Due
- 5/27/2003
- Archive Date
- 5/2/2004
- Point of Contact
- Mary Sandy, Contract Specialist, Phone 202-767-3710, Fax 202-767-0430, - F. Janilea Bays, Contracting Officer, Phone 202-767-2974, Fax 202-767-0430,
- E-Mail Address
-
sandy@contracts.nrl.navy.mil, bays@contracts.nrl.navy.mil
- Description
- The purpose of this amendment is to answer questions from potential offerors, extend the response date, and correct errors in the original combined synopsis/solicitation. Question 1: We're curious why the specific OEM has been requested and what information does NRL have on this scope. This microscope is no longer made by the OEM, so the RFQ has requested an obsolete model, which has no IR capability? The bid does request IR backside alignment and as the specification is written, the Zeiss microscope should be disqualified as an optical microscope. Answer 1: As stated in 4.1 of the Specifications, the aligner must be equipped with a Zeiss Split Field Microscope or a microscope of comparable range of magnification and positional range (stated in Section 4.2) is acceptable. If a new microscope is not available a refurbished one with the same warranty as a new unit is acceptable and the microscope must have an objective separation range of at least 20-120 mm. Question 2: Section 1.3, is IR backside imaging required in the bid or does the tool have to be field upgradeable? Can the tool have bottom side optical imaging instead of IR? Answer 2: IR backside imaging is required and optical imaging is acceptable instead of IR. Question 3: Section 2.1, states samples 0.5"-8", but section 3.3 states the beam size can be 6" Is 8" a requirement? Answer 3: The capability of doing 9" wafers is required. The 6" beam diameter means that we won't be able to expose the whole 8" wafer and this is acceptable. Question 4: Section 2.2 Can the tool use bottom loading standard Mask holders for vacuum contact? Answer 4: Yes it can. Question 5: Section 2.3 Why is 10 degrees of rotation and only 0.15" of x/y travel for alignment? Answer 5: The 0.15 inch (") travel is an error. It should read .75" of x/y travel. Question 6: Section 4.1, why does the microscope have to be a Zeiss? Answer 6: See answer to Question 1 above. Question 7: Section 4.1, Can a video microscope be used in place of the optical microscope? Answer 7: A video microscope can be used if it meets the specifications. Question 8: Section 4.1, do all objectives have to meet the 20mm minimum separation? Answer 8: Yes, all objectives have to meet the separation requirement. Question 9: Section 4.1, Are turrets required? Answer 9: Turrets are not required as long as changing magnification doesn't require screwing and unscrewing objectives or some equally inconvenient action. Question 10: Section 5.3, Can the system have an integrated isolation table? Answer 10: Yes, it can. Question 11: Section 6.2, why are top-loading maskholders required for vacuum contact if standard bottom loading maskholders can be used for all printing modes. Answer 11: Since this tool will be used for a wide variety of applications, the versatility is required. The latest DFARS change applicable to this requirement is corrected to read 20030430. FAR clauses 52.203-8 and 52.203-10 are not applicable and are deleted from this requirement. The Original Response date stated under "General Information" is revised to read: May 27, 2003.
- Place of Performance
- Address: NRL
- Record
- SN00325121-W 20030517/030515213758 (fbodaily.com)
- Source
-
FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)
| FSG Index | This Issue's Index | Today's FBO Daily Index Page |