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FBO DAILY ISSUE OF JUNE 05, 2003 FBO #0553
SOLICITATION NOTICE

A -- Scanning Probe Microscope (SPM) System

Notice Date
6/3/2003
 
Notice Type
Solicitation Notice
 
Contracting Office
US Army Aviation and Missile Command DAAH01, ATTN: AMSAM-AC, Building 5303, Martin Road, Redstone Arsenal, AL 35898-5280
 
ZIP Code
35898-5280
 
Solicitation Number
DAAH01-03-R-R011
 
Response Due
6/19/2003
 
Archive Date
8/18/2003
 
Point of Contact
Beverly Wills, 256-876-8761
 
E-Mail Address
Email your questions to US Army Aviation and Missile Command DAAH01
(beverly.wills@redstone.army.mil)
 
Small Business Set-Aside
N/A
 
Description
NA The Army Aviation and Missile Command proposes to procure one (1) scanning probe microscope suitable for performing all major atomic force microscopy (AFM) techniques, to include tapping mode, where tip taps against the surface of the sample at a high freq uency, penetrating the absorbed liquid layer so that the surface is imaged, on samples up to 200 mm in diameter and 12 mm thick. The system must be ready to accept optional AFM analytical test modules such as Scanning Capacitance Microscopy (SCM), Scannin g Spreading Resistance Microscopy (SSRM), Tunneling AFM (TUNA, Conductive AFM (CAFM), and Scanning Thermal Microscopy (SThM) with minimal software or hardware changes. A scanning probe microscope stage having a 125x100 mm inspectable area, motorized posit ioning with a minimum of 2um resolution with X and Y unidirectional repeatability of at least 3 um typical, and with bi-directional repeatability of at least 4 um for X and 6 um for Y. An integrated optical microscope with 150 to 675 um horizontal viewing area having a min of 1.5 um resolution, with motorized zoom and focus. The optical microscope must also have the capability for real-time color video display and image capture. A closed loop atomic force microscope (AFM) head that supports an XY scan ra nge of approx 90 um square and a Z scan range of at least 6um with a 1% XY non-linearity, a vertical noise floor less than .05 nm RMS, an XY noise floor less than 2nm RMS, and is capable of operating fluid cell for performing SPM in fluids. The system mus t be ready to accept optional AFM analytical test modules such as Scanning Capacitance Microscopy (SCM), Scanning Spreading Resistance Microscopy (SSRM), Tunneling AFM (TUNA), Conductive AFM (CAFM), and Scanning Thermal Microscopy (SThM) with minimal softw are or hardware changes. A vacuum chuck type sample holder that is at least 150 mm in diameter for locking samples in place. A vacuum pump suitable for use with the sample holder. Control hardware/software that provides the capability of scanning and im aging an array of data points of at least 4096x1024, with user selectable scan dimensions and is able to provide real time piezo linearity correction with piezo voltage/response to better than 2%. Control hardware capable of digitally reading and controll ing ti-sample separation so advanced software enhancement techniques can be utilized. Control hardware/software able to perform multiple mode passes, where topography is determined on the first pass over a scan line and a second pass, lifted over the samp le but following the topography, measures a second parameter such as magnetic field, electric field, or the force modulation signal. Images must be able to show direct correlation between topographic and second pass data. A minimum of two (2) lock-in amp lifiers, each capable of 360-degree quantitative cantilever phase detection int he frequency range of 10 Hz to 2 MHz. A minimum of four (4) 16-bit analog-to-digital (A/D) converters with software controlled variable gain inputs to digitize the outputs of the lock-ins for phase detection. A minimum of three (3) 16 bit DACs for each channel (Z,Y,Z), one each for scan size, scan pattern, and offset. A single large area scanner (90um) must be able to provide small scans (less than 50nm) without artifacts cas ed by quantization or aliasing. Software and computer interface for nano-manipulation, nanolithography, and scanning to allow manipulation and lithography at the nanometer and molecular scale. Software must allow user to control probe velocity, vertical position, and applied voltages. Software must enable automated step and repeat measurements and image generation. Supplied software should also be capable of building custom lithography programs and routines. The nano-manipulation, nanolithography capab ility must be developed beyond the prototype stage and shall have been previously demonstrated in instruments sold to customers. A vibration isolation table wi th acoustic enclosure to provide acoustic and vibration isolation. This procurement is restricted to Veeco Metrology, LLC, 112 Robin Hill Road, Santa Barbara, CA 93117. The proposed contract action is for supplies or services for which the Government int ends to solicit and negotiate with only one source under the authority of FAR 6.302 based on extensive market research for this commercial item. Interested persons may identify their interest and capability to respond to the requirement or submit proposal s. This notice of intent is not a request for competitive proposals; however, the Government will consider all proposals received within fifteen (15) days after date of publication of this synopsis. A determination by the Government not to compete with t his proposed contract based upon responses to this notice is solely within the discretion of the Government. Information received will normally be considered solely for the purpose of determining whether to conduct a competitive procurement. This is a co mbined synopsis/ solicitation for commercial items prepared in accordance with the format in Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation.
 
Place of Performance
Address: US Army Aviation and Missile Command DAAH01 ATTN: AMSAM-AC-OS-RB, Building 5400 Redstone Arsenal AL
Zip Code: 35898-5280
Country: US
 
Record
SN00338723-W 20030605/030603213619 (fbodaily.com)
 
Source
FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)

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