SPECIAL NOTICE
A -- LAWRENCE LIVERMORE NATIONAL LABORATORY SEEKS TO LICENSE THE TECHNOLOGY FOR MULTILAYER DIELECTRIC DIFFRACTION GRATINGS
- Notice Date
- 9/2/2004
- Notice Type
- Special Notice
- NAICS
- 238990
— All Other Specialty Trade Contractors
- Contracting Office
- Department of Energy, Lawrence Livermore National Laboratory (DOE Contractor), Industrial Partnerships & Commercialization, 7000 East Avenue L-795, Livermore, CA, 94550
- ZIP Code
- 94550
- Solicitation Number
- Reference-Number-FBO82-04
- Response Due
- 10/8/2004
- Archive Date
- 10/11/2004
- Point of Contact
- Connie Pitcock, Administration, Phone 925-422-1072, Fax 925-423-8988,
- E-Mail Address
-
pitcock1@llnl.gov
- Description
- LAWRENCE LIVERMORE NATIONAL LABORATORY SEEKS TO LICENSE THE TECHNOLOGY FOR MULTILAYER DIELECTRIC DIFFRACTION GRATINGS Announcement: Lawrence Livermore National Laboratory (LLNL), operated by the University of California under contract with the U.S. Department of Energy (DOE), wants to license the technology to build Multilayer Dielectric Diffraction Gratings. Researchers at LLNL have developed Multilayer Dielectric Diffraction Gratings for the compression and stretching of broadband laser pulses. The researchers designed the Multilayer Dielectric Diffraction Gratings to solve the need for high efficiency gratings used in reflection or transmission which could withstand the optical intensity present with high power laser systems. They are an enabling technology for the compression of high energy (>3 Joule) pulses on short pulse (<10 nanosecond) lasers. The forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer structure permits the fabrication of a diffraction grating of adjustable efficiency and variable optical bandwidth. Researchers have achieved diffraction efficiencies into the first order in reflection varying between 0.1 and 98 percent by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Any dielectric material which exhibits low absorption at the wavelength of interest can be used to comprise the dielectric layers. An important feature of the invention is that high diffraction efficiency can be achieved in reflection without the need for metallic coatings either overcoating the grating structure or underneath the dielectric stack. The bandwidth selectivity, ability to control the amplitude of the light scattered into different orders and high damage threshold extends the use of these gratings to applications far beyond the pulse compression use for which the gratings were initially conceived. This technology is covered by U.S. patent # 5907436 and is available for non-exclusive licensing. Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's Multilayer Dielectric Diffraction Gratings should provide a written statement of interest, which includes the following: 1. Company Name and address. 2. The name, address, and telephone number of a point of contact. 3. A description of corporate expertise and facilities relevant to commercializing this technology. Written responses should be directed to: Lawrence Livermore National Laboratory Industrial Partnerships and Commercialization P.O. Box 808, L-795 Livermore, CA 94551-0808 Attention: FBO 82-04 Please provide your written statement within thirty (30) from the date this announcement is published to ensure consideration of your interest in LLNL's Multilayer Dielectric Diffraction Gratings.
- Record
- SN00664049-W 20040904/040902211746 (fbodaily.com)
- Source
-
FedBizOpps.gov Link to This Notice
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