Loren Data's SAM Daily™

FBO DAILY ISSUE OF OCTOBER 14, 2005 FBO #1418
SOURCES SOUGHT

66 -- Vertical Focusing X-Ray Mirror System

Notice Date

10/12/2005
 

Notice Type

Sources Sought
 

NAICS

339111 — Laboratory Apparatus and Furniture Manufacturing
 

Contracting Office

Department of Energy, Brookhaven National Laboratory (DOE Contractor), Brookhaven, PO Box 5000 Bldg. No. 355, Upton, NY, 11973
 

ZIP Code

11973
 

Solicitation Number

JM100827
 

Response Due

10/18/2005
 

Archive Date

11/1/2005
 

Description

BSA/BNL is seeking to maximize competition for this Vertical Focusing X-Ray Mirror System. The NSLS X25 beamline requires a new meridional focusing mirror system, to focus the beam vertically. The mirror will be located at 23.0 m from the source, and the nominal focal position is at 26.5 m from the source, therefore the nominal focus demagnification is 6.6:1. The FWHM value of the horizontal source size is 0.784 mm, of the horizontal source divergence is 0.449 mrad, of the vertical source size is 0.017 mm, and of the vertical source divergence is 0.061 mrad. There will be placed, upstream of the mirror at 20.3 m from the source position, a double Si(111) crystal monochromator which incorporates a sagittal focusing second crystal to focus the beam horizontally, at a nominal demagnification of 3.3:1. The range of tunability of the monochromator will span from a minimum energy of 4.5 keV or less to a maximum energy of 20 keV or greater. The mirror will act upon the monochromatic beam, and will operate at a nominal glancing angle of incidence of 3 mrad. The mirror will need to reflect the chosen photon energy, that is diffracted by the fundamental Si(111) Bragg reflection of the monochromator, and not to reflect the allowed harmonics (Si(333) and higher). To preserve the glancing angle of incidence, more than one reflecting strip will need to be included on the mirror?s surface (e.g. there could be two strips, one of which is uncoated and the other of which is a palladium or rhodium coating, in the event that the mirror substrate is silicon or glass). The mirror system will include a bender that can shape the mirror to the proper figure, a UHV enclosure, and a manipulation system. All interested manufacturers should contact Jody Mitchell via email to: jmitchell@bnl.gov for a formal RFP. IN THE SUBJECT LINE OF THE EMAIL, YOU MUST WRITE RFP #JM100827. Failure to do this will result in non receipt of RFP.
 

Place of Performance

Address: BROOKHAVEN NATIONAL LABORATORY, UPTON, NY

Zip Code: 11973

Country: USA
 

Record

SN00914427-W 20051014/051012211957 (fbodaily.com)
 

Source

FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)

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