SOLICITATION NOTICE
10 -- Plasma Enhanced Chemical Vapor Deposition Chamber
- Notice Date
- 3/22/2007
- Notice Type
- Solicitation Notice
- Contracting Office
- N68936 Naval Air Warfare Center Weapons Division Dept.1 429 E. Bowen Rd - Stop 4015 China Lake, CA
- ZIP Code
- 00000
- Solicitation Number
- N6893607T0051
- Response Due
- 4/5/2007
- Archive Date
- 6/4/2007
- Description
- SPECIFICATIONS for PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER 1. Minimum 16" diameter Anodized Aluminum Chamber water cooled chamber top and baseplate. 2. Minimum 12" diameter stainless steel water cooled lower electrode(accepts minimum 8" wafer or fine powder substrates). Note: platen must be grounded. 3. Minimum 12" diameter water cooled upper electrode for Plasma Excitation. 4. Temperature controlled water re-circulator for controlling temperature of lower electrode during PECVD processing (Note: Operating temperature must meet 0 - 80 degrees C minimum). 5. Minimum 4 channels of mass flow (at least 0 - 1000 sccm), including gas manifold, pneumatic isolation valves and 0.003 micron inline gas filters. 6. Mechanical pumping package providing processing and monitoring vacuum operations. 7. Stainless steel convoluted bellow connecting hose and fittings, allowing vacuum connections to and from mechanical pumping package and main system vacuum bulkhead fitting 8. 1\4" quick disconnect Swagelok fittings for cooling water and compressed air. 9. Appropriate system software architecture for process and monitoring PECVD operations. 10. Compatible computer and associated periphereals for process and monitoring PECVD operations. 11. Down stream pressure control and throttling valves (Note: used in conjunction with processing software with RS-232 interface). 12. Systems and Operations Manuals (both hard and CD rom copy). 13. Parts and Labor warranty 14. Available Training and Commissioning NAICS Code = 333298 Place of Performance = N/A Set Aside = N/A
- Record
- SN01257275-W 20070324/070322221714 (fbodaily.com)
- Source
-
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