MODIFICATION
66 -- Ultra High Vacuum Thin Film Deposition System
- Notice Date
- 1/18/2008
- Notice Type
- Modification
- NAICS
- 333295
— Semiconductor Machinery Manufacturing
- Contracting Office
- Department of the Navy, Office of Naval Research, Naval Research Laboratory, 4555 Overlook Ave. S.W., Washington, DC, 20375, UNITED STATES
- ZIP Code
- 00000
- Solicitation Number
- N00173-08-R-RF01
- Response Due
- 1/24/2008
- Archive Date
- 2/8/2008
- Point of Contact
- Roger Fordahl, Contract Specialist, Phone 202-767-7620, Fax 202-767-5896, - F. Janilea Bays, Contracting Officer, Phone 202-767-2974, Fax 202-767-0430
- E-Mail Address
-
roger.fordahl@nrl.navy.mil, jan.bays@nrl.navy.mil
- Small Business Set-Aside
- Total Small Business
- Description
- This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Federal Acquisition Regulations (FAR) Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. The solicitation, N00173-08-R-RF01, is issued as a Request for Proposal (RFP). The solicitation document, incorporated provisions, and clauses are those in effect through FAC 2005-22 and DFARS Change Notice 20071207. The associated small business size standard is 500 employees or less. NRL has a requirement for CLIN 0001, Ultra High Vacuum Thin Film Deposition System, and an option item, CLIN 0002, Residual Gas Analyzer. The deposition system must be a UHV design that allows baking to 200?C to provide an ultra-high vacuum environment for highly oxygen-sensitive materials. The system must consist of a sputtering chamber with seven 2? magnetron sources for con-focal sputtering, each with an individual pneumatic shutter and an isolation chimney, a e-beam evaporation chamber, a load-lock and an appendage chamber for processing. The magnetron sources must allow a reconfiguration among balanced, unbalanced and magnetic material modes depending upon the application. The magnets for the magnetron sources must be located out of the cooling water and be vacuum compatible to 10-11 Torr. The UHV sources must be able to be baked to 200?C without magnet removal prior to system bakeout. The substrate heater must allow for simultaneous heating, rotation, biasing, z-motion, and deposition at up to 850?C in a pure oxygen environment. Temperature stability must be +/- 1?C. The offeror must include installation and training. The residual gas analyzer must able to monitor the base vacuum with 5 x 10-14 Torr detection limit and the process at operating pressure of up to 10 Torr for atomic mass unit (amu) of up to 300 amu with better than 1 amu resolution. Multiple awards may result from this synopsis solicitation. If made, multiple awards will only be made for an individual CLIN. Any option items, if exercised, may be exercised at any time up to six months after the date of the initial award.
- Record
- SN01488865-W 20080120/080118224843 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
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