SPECIAL NOTICE
A -- TECHNOLOGY/BUSINESS OPPORTUNITY DRY RELEASE MIRROR STRUCTURE FOR PHOTONIC DEVICES TECHNOLOGY
- Notice Date
- 8/29/2008
- Notice Type
- Special Notice
- NAICS
- 238990
— All Other Specialty Trade Contractors
- Contracting Office
- Department of Energy, Lawrence Livermore National Laboratory (DOE Contractor), Industrial Partnerships & Commercialization, 7000 East Avenue, L-795, Livermore, California, 94550
- ZIP Code
- 94550
- Solicitation Number
- FBO198-08
- Response Due
- 9/29/2008
- Archive Date
- 9/30/2008
- Point of Contact
- Connie L Pitcock, Phone: 925-422-1072
- E-Mail Address
-
pitcock1@llnl.gov
- Small Business Set-Aside
- N/A
- Description
- TECHNOLOGY/BUSINESS OPPORTUNITY DRY RELEASE MIRROR STRUCTURE FOR PHOTONIC DEVICES TECHNOLOGY Opportunity : Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract with the U.S. Department of Energy (DOE), is offering the opportunity to license LLNL's Dry Release Mirror Structure for Photonic Devices technology. Background : Current technology for fabricating free-standing micro-mirror structures in photonic devices involves the use of wet-chemistry based undercutting procedures. These procedures result in a slow and difficult fabrication process which reduces the yield and lifetime of the device. Furthermore, the use of wet chemical etching may produce bubbling and out-gassing, leading to failure of the fragile free-standing mirror during subsequent processing. Description : LLNL has developed an invention that simplifies the fabrication of and improves the yield for suspended mirror structures commonly used in surface-normal photonic devices, as well as fixed- wavelength structures containing an integrated air gap. Additionally, this procedure enables a tremendous increase in the etching rate, reducing undercutting times from tens of minutes or hours to seconds. The invention uses a new non-plasma etch process based on a noble gas halide to rapidly undercut a novel room-temperature deposited sacrificial film. This process can be extended to the release of large area structures that are not feasible with existing etch technology. Advantages : This invention provides both a simpler fabrication technique and an improved yield from the fabrication process. Additionally, undercutting process times may be reduced by many orders of magnitude enabling the generation of large area free-standing thin films. Potential Applications : LLNL researchers have demonstrated the use of this invention for micromechanically tunable photonic devices including tunable surface emitting lasers and wavelength tunable filters. This process is also relevant to thin film and multi-junction photovoltaic structures. Development Status: LLNL has demonstrated the success of this procedure by fabricating a number of prototype devices.. LLNL is seeking industry partners with a demonstrated ability to bring such inventions to the market. Moving critical technology beyond the Laboratory to the commercial world helps our licensees gain a competitive edge in the marketplace. All licensing activities are conducted under policies relating to the strict nondisclosure of company proprietary information. Please visit the IPAC website at http://www.llnl.gov/IPandC/workwithus/partneringprocess.php for more information on working with LLNL and the industrial partnering and technology transfer process. Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's Dry Release Mirror Structure for Photonic Devices technology should provide a written statement of interest, which includes the following: 1. Company Name and address. 2. The name, address, and telephone number of a point of contact. •3. A description of corporate expertise and facilities relevant to commercializing this technology. Written responses should be directed to: Lawrence Livermore National Laboratory Industrial Partnerships and Commercialization P.O. Box 808, L-795 Livermore, CA 94551-0808 Attention: FBO 198-08 Please provide your written statement within thirty (30) days from the date this announcement is published to ensure consideration of your interest in LLNL's Dry Release Mirror Structure for Photonic Devices technology.
- Web Link
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FedBizOpps Complete View
(https://www.fbo.gov/?s=opportunity&mode=form&id=4ab43b7c42c9234586b77aed1fd61f99&tab=core&_cview=1)
- Record
- SN01655456-W 20080831/080829221159-4ab43b7c42c9234586b77aed1fd61f99 (fbodaily.com)
- Source
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