SOURCES SOUGHT
A -- Local Control of Chemistry (LOCO) for Materials Synthesis
- Notice Date
- 12/23/2009
- Notice Type
- Sources Sought
- NAICS
- 541712
— Research and Development in the Physical, Engineering, and Life Sciences (except Biotechnology)
- Contracting Office
- Other Defense Agencies, Defense Advanced Research Projects Agency, Contracts Management Office, 3701 North Fairfax Drive, Arlington, Virginia, 22203-1714
- ZIP Code
- 22203-1714
- Solicitation Number
- DARPA-SN-10-15
- Archive Date
- 1/29/2010
- Point of Contact
- Brian Holloway,
- E-Mail Address
-
DARPA-SN-10-15@darpa.mil
(DARPA-SN-10-15@darpa.mil)
- Small Business Set-Aside
- N/A
- Description
- DESCRIPTION The Defense Sciences Office (DSO) of the Defense Advanced Research Projects Agency (DARPA) is seeking innovative ideas that may support a potential new DARPA program designed to provide revolutionary approaches to materials synthesis, allowing unprecedented materials combinations and synthetic flexibility. High-impact, technologically-relevant materials such as tribological thin film coatings (e.g., diamond) and electrode materials (e.g., carbon nanotubes) are made via a suite of common synthetic techniques. For the materials of interest in this Request for Information (RFI), all deposition techniques including chemical vapor deposition, molecular beam epitaxy, physical vapor deposition, ion beam sputtering, and atomic layer deposition, employ extreme bulk (macro-scale) conditions such as high temperature (>400 °C), sub-atmospheric pressure, and/or bulk mixing to achieve desired thin film composition, microstructure, morphology, and quality. Use of these bulk processing techniques drastically limits synthetic flexibility and substrate choice (e.g. eliminating most polymers and biological substrates such as living cells), and introduces significant challenges for realizing fine spatial control (e.g. nanoscale patterning). However, at the fundamental level, such materials are built from simple chemical reactions that are inherently local (nano- and atom-scale). DARPA is interested in detailed submissions of novel approaches to materials synthesis on the local (nano- and atom-scale) level that promote spatial, temporal and output specificity for thin film reactions traditionally requiring extreme conditions. Complete process approaches that demonstrate the ability to mimic high temperature deposition through localization of reactant generation, removal of by-products, and input/extraction of energy at an atomic scale (i.e. at the reaction location) are of interest. Although successful approaches will likely integrate multiple component strategies, descriptions of control over one aspect of the materials synthesis are also desired. For example: • Production of reactive species stable at/on a surface for the timeframe, at the location, and in the appropriate flux rates to mimic traditional high temperature thin-film growth; • Demonstration of energy imparted to surface reactants/products to effectively mimic a high temperature surface reaction for thin-film growth without impacting the bulk temperature of the substrate; or • Demonstration of product-specific local reactions, which traditionally require high temperature (>400 °C) and sub-atmospheric pressure, under lower temperature (<200 °C) and/or non-vacuum conditions. Ideas related to iterative advances of traditional materials synthesis technologies, as well as those that are not focused on radically reducing the overall thermal budget for deposition (i.e., localizing the energy needed exclusively to the site of thin-film growth), and/or do not provide dramatically enhanced spatial control, should not be submitted. REQUESTED INFORMATION DARPA appreciates responses from all capable and qualified sources including, but not limited to, universities, university affiliated research centers, and private or public companies. Presentation of any available preliminary data is encouraged. To ensure that all technically relevant aspects of the RFI are fully addressed, technologies and capabilities should target the following criterion: i. Novelty: Of particular interest are novel, revolutionary approaches that address materials synthesis though local control of chemical reactions, without the need for high temperatures (>400 °C) and low pressures (<1 atm). Existing intellectual property should be clearly identified. Specifically excluded from this RFI are iterative improvements on current synthetic technologies and non-scalable technologies. Submissions should clearly indicate how the proposed approach radically shifts the traditional paradigms of materials synthesis. ii. Materials & Applications: Submissions may address any one of a number of technologically-relevant thin-film materials which are generally restricted to high temperature vacuum deposition, including, but not limited to: diamond, BN, TiO2, SiC, carbon nanotubes, graphene, TiB2, ZrO2, YSZ, and B4C. Respondents should: a. Explicitly identify the material(s) compatible with their approach, as well as material(s) that are inherently incompatible. b. Identify applications and insertion opportunities for the identified material(s). iii. Technical Capability: Submissions must provide evidence and/or theoretical foundations for revolutionary improvements over state of the art technologies in temperature, pressure, and/or spatial control. iv. Limitations: Submissions should address the underlying scientific and technological barriers as well as any potential limitations (fundamental, technological, or practical) of the approach. An analysis of limiting factors such as materials, chemistry, and/or engineering required for the proposed concept should be highlighted. v. Related Work and Previous Experience: Examples of current and previous work that provide evidence for the potential of the proposed concept should be included if applicable. Experimental demonstration of LOCO concepts, models, and/or information about currently licensed products is also of particular interest. vi. Commercialization Opportunity: While focused on revolutionary ideas and concepts, the ultimate goal envisioned is development of a commercial opportunity. INSTRUCTIONS TO RESPONDERS Respondents to this RFI are encouraged to be as succinct as possible, while also providing actionable insight. Two responses are requested: (1) a short abstract to be submitted by 12pm EST on January 5, 2010 (2) a full submission with supporting slides by 12pm EST on January 13, 2010 Each submission should be typed in 12 point, single-spaced font on 8.5 by 11 inch paper, with 1-inch margins. All submissions must be electronic, adhere to the content formatting described below and use one of the following file formats: Adobe PDF or Microsoft Word. Abstract (two pages including cover page): DUE January 5, 2010 at 12pm EST 1. Cover Page (one page) a. Title b. Organization c. Responder's technical and administrative points of contact (names, addresses, primary phone, secondary phone, and fax numbers, and email addresses) 2. Abstract (one page): Succinct technical overview of the proposed approach. The abstract may include both text and figures. Full Submission (six pages including cover page; up to three slides): DUE January 13, 2010 at 12 pm EST 1. Cover Page (one page) a. Title b. Organization c. Responder's technical and administrative points of contact (names, addresses, primary phone, secondary phone, fax numbers, and email addresses) 2. Technical areas (up to four pages) a. A restatement of the one page abstract provided by January 5, 2010 b. A discussion of the challenge addressed (from your perspective) c. A technical description of the proposed technology addressing the first four criterion listed above: i. Novelty ii. Materials & Applications iii. Technical Capability iv. Limitations 3. Other Information (up to half a page) a. A discussion of the remaining criterion listed above: i. Related Work & Previous Experience ii. Commercialization Opportunity 4. References (half page) a. All references to previously published work should be contained within this space. 5. Additionally, all interested parties should submit a Microsoft PowerPoint presentation, not to exceed 3 slides, that addresses the technical aspects of the response. Two slides are to be used for a bulleted summarization of the information presented in the written submission. Figures not included in the written submission may be inserted into the space available on these slides. The third slide (penta-chart) should summarize the proposed approach technology (the ‘penta chart' should follow the format given at http://www.darpa.mil/dso/solicitations/sn10-15.htm). The purpose of this slide is to visually and succinctly indicate the new insights motivating the proposed effort, the main objectives, the underlying technical mechanisms, fundamental assumptions and limitations, key innovations, expected impact, and other unique aspects of the proposal. SUBMISSION Responses to this RFI should be submitted to DARPA-SN-10-15@darpa.mil. Please refer to the "LOCO RFI" in all correspondence. All technical and administrative correspondence and questions regarding this announcement should also be submitted to the same email address. Emails directly to the Program Manager may result in delayed/no response. DISCLAIMERS AND IMPORTANT NOTES This is an RFI issued solely for information and new program planning purposes; it does not constitute a formal solicitation for proposals. In accordance with FAR 15.201(e), responses to this notice are not offers and cannot be accepted by the Government to form a binding contract. Submission is voluntary and is not required to propose to a subsequent Broad Agency Announcement (BAA) (if any) or other research solicitation (if any) on this topic. DARPA will NOT provide reimbursement for costs incurred in responding to this RFI. NO CLASSIFIED INFORMATION SHOULD BE INCLUDED IN THE RFI RESPONSE OR SLIDES. It is the submitter's responsibility to clearly define to the Government what is considered proprietary data. Any proprietary information should be clearly labeled as "proprietary". DARPA will disclose submission contents only for the purpose of review and evaluation. Respondents are advised that DARPA is under no obligation to acknowledge receipt of the information received or provide feedback to respondents with respect to any information submitted under this RFI.
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