SOLICITATION NOTICE
66 -- High Vacuum Sputter Coating System
- Notice Date
- 8/30/2012
- Notice Type
- Combined Synopsis/Solicitation
- Contracting Office
- N62271 Naval Postgraduate School 1 University Circle Monterey, CA
- ZIP Code
- 00000
- Solicitation Number
- N6227112Q1143
- Response Due
- 9/12/2012
- Archive Date
- 9/27/2012
- Point of Contact
- Robert B Gallagher 831-656-7853
- Small Business Set-Aside
- N/A
- Description
- High Vacuum Sputter Coating System About the equipment: One of the requirements of scanning electron microscopy is that specimens must be conductive. Non-conducting materials need to be coated with a conducting material, such as gold or carbon. In particular high resolution imaging of non-conducting materials require extremely thin, grain-free, uniform coatings so that charging effects are eliminated. Thus precise control of deposition parameters and deposited material thickness is very important. This deposition of metallic materials is usually carried out by means of a compact low voltage magnetron sputter coater primarily designed for depositing very thin conductive metal coatings on the samples that will be examined in the Field emission scanning electron Microscope. Importance and relevance in NPS programs: Many materials that are being studied for various critical US Navy applications are electrically nonconductiong ( polymers, oxides, many ceramic materials etc. ) and microstructural characterization of such materials by high resolution electron microscopy, requires that their surface be coated with a very thin (0.5 “ 5 nm) conductive metal coatings. Numerous such materials are being studied currently by many faculty members in the Department of Mechanical and Aerospace Engineering as well as the Department of Physics. Thus many of the research programs and Master ™s thesis work conducted by students following the 570 curriculum routinely require the use of such an equipment. At present there is no such working equipment available at NPS. Specifications for the equipment: The high vacuum sputter deposition equipment requested here must be a unit complete with all the necessary power supplies, vacuum system components and all the accessories required for the operation of the supplied equipment. 1.The equipment must be a compact desktop equipment 2.The power source should compatible with 115V/60Hz/1phase operation 3.The DC magnetron design and the high vacuum system should be capable of allowing sputtering of a wide range of materials including non-oxidizing materials like Au, Pt-20Pd,etc. as well as oxidizing materials like Fe, Cr, Ni, Nb etc. 4.Precise microprocessor-controlled sputter supply and independent current control must be provided with all necessary safety interlocks and features. 5.Dry oil-free all metal vacuum system with scroll pump/ turbo pump combination and all necessary vacuum conections must be supplied. 6.Rotary, planetary and tilting stage movements and height adjustments must be available for depositing the conductive metal uniformly on the samples. All necessary adapters must be included. 7.Several sample holders including the 6mm x 12.7 mm SEM mounts for the ZEISS FESEM must be provided. Holders for 32 mm metallographic mounts also must be available. 8.The thickness of deposited coating must be optimized for high resolution examination of non-conducting materials in the Field Emission scanning electron Microscope. 9.Thickness monitor/controller must be included 10.Two sputter targets (one Cr and one Pt/Pd) must be provided. 11.The quote should also include one each of Al, Fe, Ni and Pd targets 12.Argon gas purge/leak must be automatically controlled and all required connections and regulators must be included so that connection from the gas cylinder supplied by us is possible. 13.All electrical must be for 115V/60Hz. 14.Supply of extra crystals 9at least one pack) for the thickness monitor also be included. 15.Installation, training and freight charges also must be included in quote. Please send quotes and any questions to Rober B Gallagher @ rbgallag@nps.edu
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