SOLICITATION NOTICE
66 -- Thin Film Dielectric/Metal Deposition System
- Notice Date
- 9/9/2015
- Notice Type
- Combined Synopsis/Solicitation
- NAICS
- 333242
— Semiconductor Machinery Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B130, Gaithersburg, Maryland, 20899-1410, United States
- ZIP Code
- 20899-1410
- Solicitation Number
- NB686040-15-03301
- Archive Date
- 9/30/2015
- Point of Contact
- Angela L. Hitt, Phone: 3034977305
- E-Mail Address
-
angela.hitt@nist.gov
(angela.hitt@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. This solicitation, NB686040-15-03301, is issued as a request for quotation (RFQ). This solicitation document and incorporated provisions and clauses are those in effect through Federal Acquisition Circular 2005-84. The associated North American Industrial Classification System (NAICS) code for this procurement is 333242, with a small business size standard of 500 employees. This is unrestricted and all interested parties may submit a quotation. It is being issued using the simplified acquisition procedures under the authority of FAR 13.5 Certain Commercial Items. This combined synopsis/solicitation is for the following commercial item(s): CLIN 0001: One (1) Thin Film Dielectric/Metal Deposition System Description of requirements for the items to be acquired: National Institute of Standard and Technology's (NIST) Division 686 is in need of a thin film dielectric/metal deposition system that will be used for the development of high efficiency superconducting single photon devices that utilize superconducting thin films and dielectric thin films/multilayers. The system is needed for depositing dielectric thin films, including but not limited to TiO2, SiO2, Ta2O5, and MgF2 that will enable record efficiencies for single photon detector at various wavelengths from ultraviolet (UV) to mid-infrared (IR). The Contractor shall provide all components for one (1) Thin Film Dielectric/Metal Deposition System that meets the following minimum technical requirements. The Contractor shall deliver the system, deposition chamber, loadlock assembly, pumping, gauges, & gas handling, substrate holder, deposition sources, testing and warranty, as described below. TECHNICAL SPECIFICATIONS: The Contractor shall provide one (1) Thin Film Dielectric/Metal Deposition System as described below. The deposition system shall include a minimum of 3 and preferably 4 Magnetron Sputter Deposition Sources and 1 Ion Source for Ion-assisted deposition (IAD). The system shall include a load-lock chamber. Additionally, the system shall include substrate surface cleaning capabilities and RF biasing during deposition. The system must be capable of maintaining sustained substrate temperatures of < 100 °C during deposition. The system must meet the following specifications: 1. General Specifications • The deposition system shall include a minimum of 3 and preferably 4 magnetron sputtering sources (3" target size) and one ion source. • The system shall include a load-lock chamber. • Co-sputtering capable • The system shall include substrate surface cleaning capabilities and RF biasing during deposition. • The wafer temperature should not exceed 100 ºC during deposition. The system shall have a substrate cooling design using water cooling with a closed loop chiller or other acceptable methods such as air cooling of substrate, or using large thermal mass cooling. • The system should be Class 100 clean-room compatible (excluding the rough vacuum pump) designed to sit entirely within a cleanroom, while hook-ups to house facilities, such as gas line connections and vacuum lines, will pass through the wall of the clean-room to the service chase. • The system shall utilize single point connections for any necessary house facilities (such as chilled water, compressed air, vent gas, process gas). • The system shall be equipped with an easily accessible emergency button (red in color) shut-off switch. When activated, it safely turns off any ongoing process without damage to a sample in process during the shut-down procedure. • The system must be new. Used and/or refurbished systems or components are not acceptable. 2. Deposition Chamber • The deposition chamber shall be fabricated from stainless steel. • Multiple CF ports shall be provided including at least one (preferable 2) 6" CF view port with integrated shutter, CF pumping port, roughing and N2 vent ports, vacuum gauges, and at least 2 general purpose CF on top and bottom of the chamber facing the wafer, for future endpoint detection system/ optical monitoring. • Water manifold with flow sensor(s) 3. Loadlock Assembly: • The load lock (LL) vacuum chamber shall be capable of handling wafer holders for 76.2mm (3-inch wafer) and 100 mm wafers with less than a 3 mm edge exclusion region. • The load lock will have a quick access door and view port to provide easy loading and unloading of the substrate holders. • The load lock chamber shall be pumped via a turbo pump with splinter screen, backed out by a mechanical pump. • The load lock shall include vacuum gauges connected to suitable readout and display devices. • The load lock shall provide a pressure below 5 x 10-7 Torr after 30 minutes. • The loadlock chamber shall be isolated from the deposition chamber by a gate valve with a CF flange. • The system shall have either manual transport of the wafer from the load lock into the main chamber or proven, reliable automatic transfer system. The transport mechanism must be robust with no observed failures or wafer breakages. 4. Pumping, Gauges and Gas Handling: • The pumping system should consist of a turbo pump backed by mechanical backing pump. • A base pressure better than or equal to 5 x 10-8 Torr shall be guaranteed for the deposition chamber. • A throttle valve to limit pumping conductance and provide automatic pressure control by interfacing with a capacitance manometer via a PID controller. • Vacuum Gauge package should include an ion gauge to measure the pressure in the main chamber, a wide range gauge to monitor the chamber pressure from atmospheric pressure down to below 10-3 Torr and a capacitance manometer to indicate 1-50 mTorr pressures. • Two mass flow control (MFC) units shall be supplied as follows: Argon (100 sccm) and Oxygen (50 sccm). Each MFC valve shall include one electro-pneumatic shut off valve. • A reactive gas line (Oxygen) should be plumbed to the substrate gas ring. 5. Substrate Holder • The rotation stage shall be compatible with substrate sizes up to 100mm (4-inch) diameter substrates. A substrate holder shall be provided to handle 76.2mm (3-inch) wafers with less than a 3 mm edge exclusion region. • Continuous motorized rotation (speeds up to 40 RPM) during deposition. • The substrate stage shall be designed such that the wafer temperature will not exceed 100 ºC during deposition. The system shall have a substrate cooling design using water cooling with a closed loop chiller or other acceptable methods such as air cooling of substrate or using large thermal mass cooling. • RF/DC biasing capability while rotating/depositing. The system shall include a single 100 Watt RF power supply with automatic matching network. • Substrate gas ring for reactive deposition. • Pneumatically actuated substrate shutter 6. Deposition Sources • A minimum of three (3) UHV 3-inch diameter magnetron sputter sources in a sputter-up con-focal arrangement. The source positions shall be adjustable (in situ tilt) to obtain maximum uniformity over the rotating substrate. • The sources shall be mounted on their own CF flanges each with its own electro-pneumatic shutter. The shutter and geometry shall be designed to minimize cross contamination between sources • The power supplies for the gun configurations shall have a DC power supply with integral 4-way switchbox, with the ability to configure two of the guns for RF operation. • At least two magnetron sources should be compatible with both RF and DC power supplies. • One (1) 13.56 MHz, 600-watt RF power supply with impedance matching network shall be provided for the RF operation of the sources. The RF power supply should be able to switch between two of the guns. • One (1) ion source with power supply should be provided. The ion source should have a pneumatic shutter and direct line-of-sight to the substrate. 7. Acceptance Testing: The system shall undergo on-site acceptance testing (per below acceptance specifications) with customer training at the NIST Boulder Labs. • Deposition uniformity better than +/- 2.5% over 3" diameter wafer with RF deposited SiO2. • Base vacuum better than or equal to 5.0 x 10-8 Torr. 8. One (1) Year Warranty BASIS OF AWARD: Award shall be made to the lowest priced, technically acceptable quoter. This will be a firm fixed price purchase order to the responsible contractor submitting a quote that meets all of the requirements of this RFQ and who has the lowest price. TECHNICAL CAPABILITY: Evaluation of Technical Capability will be based on the information provided in the quotation. Documentation submitted in the quotation shall be evaluated to determine that the proposed equipment meets or exceeds the Governments minimum required specifications. PRICE: Price shall be evaluated for reasonableness. The provision at FAR 52.212-1, Instructions to Offerors-Commercial, applies to this acquisition. Offerors shall meet the technical specifications and deliverable schedule. FAR 52.212-2, Evaluation -- Commercial Items, applies to this acquisition. (Quotes shall be evaluated in accordance with the criteria shown above). The quoter must have completed the provision at FAR 52.212-3, Offeror Representations and Certifications -- Commercial Items. Reps and certs must be uploaded to the System for Award Management at www.sam.gov. FAR 52.212-4, Contract Terms and Conditions -- Commercial Items, applies to this acquisition. FAR 52.212-5, Contract Terms and Conditions Required To Implement Statutes Or Executive Orders -- Commercial Items applies to this acquisition. Additional FAR 52.212-5 clauses cited in the clause applicable to this acquisition are: 52.203-6, Restriction on Subcontractor Sales to the Government with Alternate 1 52.204-10, Reporting Executive compensation and First-Tier Subcontract Awards 52.209-6, Protecting the Government' Interest When Subcontracting with Contractors Debarred, Suspended, or Proposed for Debarment 52.219-6, Notice of Total Small Business Aside 52.219-8, Utilizing of Small Business Concerns 52.219-14, Limitations on Subcontracting 52.219-28, Post Award Small Business Program Re-representation 52.222-3, Convict Labor 52.222-19, Child Labor - Cooperation With Authorities And Remedies 52.222-21, Prohibition of Segregated Facilities 52.222-26, Equal Opportunity 52.222-35, Equal Opportunity for Veterans 52.222-36, Affirmative Action for Workers with Disabilities 52.222-37, Employment Reports for Veterans 52.222-40, Notification of Employee Rights Under the National Labor Relations Act 52.222-50, Combating Trafficking in Persons 52.223-18, Contractor Policy to Ban Text Messaging While Driving 52.225-1, Buy American-Supplies 52.225-13, Restrictions on Certain Foreign Purchases 52.232-33, Payment by Electronic Funds Transfer FAR 52.252-1, Solicitation Provisions Incorporated by Reference (Feb 1998) This solicitation incorporates one or more solicitation provisions by reference, with the same force and effect as if they were given in full text. Upon request, the Contracting Officer will make their full text available. The offeror is cautioned that the listed provisions may include blocks that must be completed by the offeror and submitted with its quotation or offer. In lieu of submitting the full text of those provisions, the offeror may identify the provision by paragraph identifier and provide the appropriate information with its quotation or offer. Also, the full text of a solicitation provision may be accessed electronically at this/these address(es): at http://acquisition.gov/comp/far/index.html and http://www.osec.doc.gov/oam/acquistion_management/policy/default.htm FAR 52.225-18 - Place of Manufacture FAR 52.232-13, Notice of Progress Payments FAR 52.232-16, Progress Payments CAR 1352.213-70, Evaluation Utilizing Simplified Acquisition Procedures CAR 1352.215-70, Proposal Preparation CAR 1352.233-70, Agency Protests CAR 1352.233-71, GAO and Court of Federal Claims Protests FAR 52.252-2, Clauses Incorporated by Reference (Feb 1998) This contract incorporates one or more clauses by reference, with the same force and effect as if they were given in full text. Upon request, the Contracting Officer will make their full text available. Also, the full text of a clause may be accessed electronically at this/these address(es): http://acquisition.gov/comp/far/index.html and http://www.osec.doc.gov/oam/acquistion_management/policy/default.htm FAR 52.202-1, Definitions FAR 52.203-17, Contractor Employee Whistleblower Rights and Requirements to Inform Employees of Whistleblower Rights. FAR 52.232-40, Providing Accelerated Payments to Small Business Subcontractors. FAR 52.247-34, FOB Destination CAR 1352.201-70, Contracting Officer's Authority CAR 1352.209-73, Compliance with the Laws CAR 1352.209-74, Organizational Conflict of Interest CAR 1352.246-70, Place of Acceptance (a) The Contracting Officer or the duly authorized representative will accept supplies and services to be provided under this contract. (b) The place of acceptance will be: NIST 325 Broadway Shipping and Receiving Boulder, CO 80305 NIST LOCAL-04 BILLING INSTRUCTIONS (a) NIST prefers electronic Invoice/Voucher submissions and they should be emailed to INVOICE@NIST.GOV. (b) Each Invoice or Voucher submitted shall include the following: (1) Contract Number. (2) Contractor Name and Address. (3) Date of Invoice. (4) Invoice Number. (5) Amount of Invoice and Cumulative Amount Invoiced to-date. (6) Contract Line Item Number (CLIN). (7) Description, Quantity, Unit of Measure, Unit Price, and Extended Price of Supplies/Services Delivered. (8) Prompt Payment Discount Terms, if Offered. (9) Any other information or documentation required by the contract. (c) In the event electronic submissions are not used, The Contractor shall submit an original invoice or voucher in accordance with the payment provisions of this contract to: NIST: Accounts Payable Office 100 Bureau Drive, Mail Stop 1621 Gaithersburg, MD 20899-1621 NIST LOCAL-39 Marking/Packing Instructions If the total contract/order includes multiple quantities of the same or like item(s), segregated as separate CLIN/Item numbers, deliverables shall be packed accordingly. Each individual package/container in the shipment shall include deliverables on a per-CLIN or Item basis. For each shipment made under this contract/order, the Contractor shall furnish itemized packing list(s), enumerating the specific contents of each shipping container and what specific individual components constitute a full and complete "unit" for each bid item. The packing list shall include the brief description of each item found in the schedule. If more than one container is required for each unit, each container should be marked accordingly, e.g., "Box 1 of 2," "Box 2 of 2" and the boxes, where feasible, should be taped or shrink-wrapped together as an issuable unit. The contract number and CONTRACT LINE ITEM NUMBER (CLIN) OR ORDER ITEM NUMBER shall be placed on the exterior of all containers. The Contractor shall submit a Quote, to be received no later than 4 p.m. Mountain Time, Tuesday, September 15, 2015, and must include the following: Company name, address, phone numbers, DUNS number, itemized quote including all minimum specifications. Quotes shall be delivered via email to angela.hitt@nist.gov. Please direct any questions regarding this solicitation to Angela Hitt at angela.hitt@nist.gov no later than 11:00 a.m. Mountain Time, Friday, September 11, 2015.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/NB686040-15-03301/listing.html)
- Place of Performance
- Address: U.S. Department of Commerce, National Institute of Standards and Technology (NIST), Acquisitions Management Division, 325 Broadway, Boulder, Colorado, 80305, United States
- Zip Code: 80305
- Zip Code: 80305
- Record
- SN03878370-W 20150911/150910000441-569cef653b10fe8e204cbf9662fd5f88 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
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