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FBO DAILY - FEDBIZOPPS ISSUE OF APRIL 14, 2017 FBO #5621
SOURCES SOUGHT

66 -- Sources Sought for Plasma Focused Ion Beam (P-FIB) Circuit Editing System.

Notice Date
4/12/2017
 
Notice Type
Sources Sought
 
NAICS
334516 — Analytical Laboratory Instrument Manufacturing
 
Contracting Office
Department of the Army, Army Contracting Command, ACC - RSA (W31P4Q) Missile, BLDG 5303 SPARKMAN CIR, Redstone Arsenal, Alabama, 35898-5090, United States
 
ZIP Code
35898-5090
 
Solicitation Number
W31P4Q-17-Q-0064
 
Archive Date
5/6/2017
 
Point of Contact
Miroslaw Chodaba, Phone: 2568762105
 
E-Mail Address
miroslaw.chodaba.civ@mail.mil
(miroslaw.chodaba.civ@mail.mil)
 
Small Business Set-Aside
N/A
 
Description
REQUEST FOR INFORMATION OR SOLICITATION FOR PLANNING PURPOSES (a) The Government does not intend to award a contract on the basis of this solicitation or to otherwise pay for the information solicited except as an allowable cost under other contracts as provided in subsection 31.205-18, Bid and proposal costs, of the Federal Acquisition Regulation (FAR). (b) Although "proposal" and "offeror" are used in this Request for Information, your response will be treated as information only. It shall not be used as a proposal. (c) This solicitation is issued for the purpose of obtaining information to serve as a market survey to assist in the development of a procurement strategy. The Government seeks potential sources having experience in the development and production of plasma focused ion beam (PFIB) systems. The Government requests information on the potential source's knowledge, skill and experiences in the research, development, implementation and manufacture of leading edge state of the art focused ion beam systems, particularly systems with high beam currents (≥2.5μA). This is a Request for Information (RFI) issued pursuant to FAR 15.2. The US Army Research, Development and Engineering Command (RDECOM), Aviation and Missile Research, Development, and Engineering Center (AMRDEC) Redstone Arsenal, AL, on behalf of the US Army, desires to obtain information to serve as a market survey to aid in development and procurement strategy for acquisition of a PFIB circuit editing system. No award is intended as a result of this sources sought notice nor does the Government intend to pay for information received. Responses to this notice are not an offer and cannot be accepted by the Government to form a binding contract. For questions regarding this RFI, please contact the Government contracting POC, Mr. Miroslaw Chodaba, via email at miroslaw.chodaba.civ@mail.mil. The AMRDEC has requirements for performing failure analysis in silicon and nanotechnology systems for application in US Army missile and aviation systems. Central to these requirements is the ability to perform large scale in situ sample preparation and high resolution imaging and analysis in a single system. Additionally, it is required that this system not only be able to etch silicon at a microscopic scale, but to also selectively and precisely etch silicon dioxide, copper, low-k dielectrics, and other materials, as well. Due to the increasing complexity and shrinking size of features in silicon, the Government seeks to identify companies that have capabilities in research, development, implementation, and manufacture of leading edge focused ion beam systems and having the experience and facilities and capabilities to manufacture and commercialize these systems. The purpose of this RFI is to gather information about the research, development, and production capabilities of potential offerors in the areas of focused ion beam systems. Specifically, offerors need to address the following system capabilities: (1) Ability of the focused ion beam system to perform both bulk silicon removal as well as high-precision (≤ 25 nm) etching of silicon. Discussion should address both precision and speed in both modes of operation; (2) Detection modes, including, but not limited to, secondary electron (SE) and backscatter electron (BSE) detection; (3) System selective material etching capabilities to include, but not limited to, silicon, copper, SiO2, and low-k dielectrics. Requires a chemistry that etches copper and dielectric simultaneously, while leaving a flat and uniform trench bottom. This discussion should address material selectivity, etch rates, etch precision and support for contrast selective etching; (4) Imaging system resolution, image size, and scan rate. For purposes of this discussion, representative desired characteristics would be image resolutions of 25 nm/pixel or better, scan rates of 25 ns/pixel or faster, and image sizes of 8Mpixels or better; (5) Ability of device to provide low (≤1.5 pA) to ultra-high (≥2.5 μA) beam currents, adjustable in real time; (6) Ability of device to provide low (≤ 20V) and high (≥30kV) beam landing energies, adjustable in real time; (7) Ability of device's gas injection system (GIS) to support multiple etchant chemistries simultaneously with highly accurate and repeatable dosing; and (8) Offeror's development and implementation history of similar state-of-the-art focused ion beam systems. As previously stated, the purpose of this RFI is to gather information about the research, development, and production capabilities of potential offerors in the area of focused ion beam systems. Responses: To assist in market research associated with the research, development, implementation and manufacture of advanced focused ion beam systems, the Government is requesting information from industry. Interested parties should submit the following information: (1) tailored capability statements addressing the particulars of this effort; (2) any additional materials that are deemed appropriate by the respondent. The information provided shall not exceed 15 pages and no smaller than 12pt Times New Roman font. The objective of this process is to assess potential offerors capable of achieving the stated objectives. All questions must reference RFI number W31P4Q-17-Q-0064 and be submitted in writing no later than 9:00 AM Central Standard Time (CST) on Monday, 17 April 2017 to the contractual point of contact Mr. Miroslaw Chodaba at miroslaw.chodaba.civ@mail.mil; telephone requests for additional information will not be honored. Question submittals must also include: Company name, Commercial and Government Entity (CAGE) code, and appropriate point of contact information. All RFI responses must be submitted to the contractual point of contact, Mr. Miroslaw Chodaba at miroslaw.chodaba.civ@mail.mil no later than 4:00 PM CST on Friday, 21 April 2017. The Government requests that the respondents deliver one electronic copy in Microsoft Word or Adobe PDF format. In addition to the information provided above, all responses to this RFI must include RFI number W31P4Q-17-Q-0064, company or institution name, CAGE code, and point of contact information. NO FOREIGN PARTICIPATION IS AUTHORIZED. Acknowledgement of receipt will only be issued if a return receipt is requested with the submission. Please do not submit any classified information. All information submitted shall be adequately safeguarded from unauthorized disclosure in accordance with FAR Part 15.207. The Government reserves the right to request further clarification or request presentations to enhance the Government's understanding of the respondent's submittal. Submissions that fail to comply with the above instructions or present ideas that are not pertinent to the subject may not be reviewed. This is a request for information purposes only. This notice does not constitute a commitment by the US Army to procure products or services. THE GOVERNMENT DOES NOT INTEND TO AWARD A CONTRACT ON THE BASIS OF THIS REQUEST FOR INFORMATION OR OTHERWISE PAY FOR THE INFORMATION SOLICITED. No award is intended as a result of the RFI. Information submitted in response to this RFI is submitted at no cost to the Government and will not be returned. Any exchange of information shall be consistent with procurement integrity requirements, and all appropriate proprietary claims will be protected to prevent improper disclosure. In the event you have difficulty reading this RFI, please contact Mr. Miroslaw Chodaba at miroslaw.chodaba.civ@mail.mil for a copy of this notice.
 
Web Link
FBO.gov Permalink
(https://www.fbo.gov/notices/5d432fd4de13d43ccf34902ede753324)
 
Record
SN04470558-W 20170414/170412235244-5d432fd4de13d43ccf34902ede753324 (fbodaily.com)
 
Source
FedBizOpps Link to This Notice
(may not be valid after Archive Date)

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