SPECIAL NOTICE
A -- TECHNOLOGY/BUSINESS OPPORTUNITY Innovative Solutions for Improving Laser Damage Performance of Multi-Layer Dielectric Gratings - Image 1
- Notice Date
- 7/20/2017
- Notice Type
- Special Notice
- NAICS
- 238990
— All Other Specialty Trade Contractors
- Contracting Office
- Department of Energy, Lawrence Livermore National Laboratory (DOE Contractor), Industrial Partnerships & Commercialization, 7000 East Avenue, L-795, Livermore, California, 94550
- ZIP Code
- 94550
- Solicitation Number
- FBO350-17
- Archive Date
- 8/22/2017
- Point of Contact
- Connie L Pitcock, Phone: 925-422-1072
- E-Mail Address
-
pitcock1@llnl.gov
(pitcock1@llnl.gov)
- Small Business Set-Aside
- N/A
- Description
- LLNL large area multi-layer dielectric (MLD) grating TECHNOLOGY/BUSINESS OPPORTUNITY Innovative Solutions for Improving Laser Damage Performance of Multi-Layer Dielectric Gratings Opportunity : Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract no. DE-AC52-07NA27344 (Contract 44) with the U.S. Department of Energy (DOE), is offering the opportunity to license a new portfolio of multi-layer dielectric gratings technology to further research and develop for commercialization. Background : Diffraction gratings are important optical components with a periodic structure which splits, diffracts and disperses light into several beams traveling in different directions. The directions of these beams depend on the spacing of the grating and the wavelength of the light. Diffraction gratings find optical applications in spectrometers, spectral multiplexers and demultiplexers and in monochromators. At LLNL large area diffraction gratings have been produced with high laser induced damage threshold (LIDT) for both high-energy pulse compression and high-average power Spectral Beam Combining (SBC) applications. Scientists at the lab have developed large area multi-layer dielectric (MLD) grating fabrication techniques well suited for high-energy pulse and high average power laser applications. Description : LLNL has developed several MLD grating technologies that extend the state of the art in overall laser optical power handling capability. LLNL's MLD grating optics are the convolution of the following key technologies: 1) Optical coating designs utilizing >100 thin film layers - enables ultra-low-loss, ppm transmission levels through the coating, high diffraction efficiency, and large bandwidth. 2) Dispersive surface relief structure design - perfectly impedance matched to the thin film stack for optimum optical performance. 3) Ability to fabricate dispersive surface relief structure and advanced optical thin film coating on superior thermally conductive materials such as silicon and silicon carbide. 4) Processing techniques permitting the fabrication of optimum optical design. Advantages : LLNL's innovative MLD gratings solutions improve the performance, reliability and lifetime of optics permitting higher power operation without laser induced optical damage. Potential Applications : The primary application for LLNL's MLD gratings technology is in high power laser facilities to enable significant scaling in output energy and average power for next generation ultrafast and spectrally-combined laser systems. Development Status: LLNL has filed several patent applications for its MLD gratings: "Innovative Solutions for Improving Laser Damage Performance of Multi-Layer Dielectric Gratings". This invention consists of four key technologies to reduce optics damage in both high-energy pulse compression gratings and high-average power lasers. "Gold-overcoated dielectric diffraction grating for high average power operations". This invention is a new class of gold-overcoated diffraction grating developed for high average power laser pulse compression. "System for improving the laser damage threshold of multilayer dielectric gratings in chirped pulse amplification of lasers". This invention consists of a system configuration that significantly improves the laser damage threshold of multi-layer dielectric gratings for lasers applications. LLNL is seeking industry partners with a demonstrated ability to bring such inventions to the market. Moving critical technology beyond the Laboratory to the commercial world helps our licensees gain a competitive edge in the marketplace. All licensing activities are conducted under policies relating to the strict nondisclosure of company proprietary information. Please visit the IPO website at https://ipo.llnl.gov/resources for more information on working with LLNL and the industrial partnering and technology transfer process. Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's innovative MLD gratings technologies should provide a written statement of interest, which includes the following: 1. Company Name and address. 2. The name, address, and telephone number of a point of contact. 3. A description of corporate expertise and facilities relevant to commercializing this technology. Written responses should be directed to: Lawrence Livermore National Laboratory Industrial Partnerships Office P.O. Box 808, L-795 Livermore, CA 94551-0808 Attention: FBO 350-17 Please provide your written statement within thirty (30) days from the date this announcement is published to ensure consideration of your interest in LLNL's innovative MLD gratings technologies.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOE/LLNL/LL/FBO350-17/listing.html)
- Record
- SN04587573-W 20170722/170720234534-25f6a2c0f9276e148c58e2b6a169a44a (fbodaily.com)
- Source
-
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