MODIFICATION
66 -- Bench Top Mask Aligner
- Notice Date
- 5/17/2018
- Notice Type
- Modification/Amendment
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Health and Human Services, Food and Drug Administration, Office of Acquisitions and Grants Services - Jefferson, 3900 NCTR Road, HFT-320, Bldg 50 | Rm 421, Jefferson, Arkansas, 72079, United States
- ZIP Code
- 72079
- Solicitation Number
- 1198704
- Archive Date
- 6/8/2018
- Point of Contact
- Warren P. Dutter, Phone: 8705437577
- E-Mail Address
-
warren.dutter@fda.hhs.gov
(warren.dutter@fda.hhs.gov)
- Small Business Set-Aside
- Total Small Business
- Description
- AMENDMENT 1: Question 1: The specification is for a +/-10mm stage travel in the X-Y directions. 4mm is more than adequate for all processing. Answer: An X-Y stage travel range of at least +/- 4mm is acceptable. Question 2: Please clarify - the spec calls for a 1KW DUV and 1KW NUV at 8", and then calls for 350W NUV at 6". Mask aligners are usually set up with a certain lamp type, power, exposure field size and power supply that provides a suitable spectrum for all processes required. For example, if a mask aligner is set up for an 8" field, the exposure optics will have to be physically modified to produce a smaller beam, which is not practical. So, if the max size processed is 6", which is what is stated in the spec, then setting up the tool for a 6" exposure source is best. The larger beam size is quite frankly wasted power consumption and lower intensity per unit area. Answer: For clarification, we'll be working with substrates that will have up to 6" diameters so setting up a tool for a uniform beam size of up to 6" in diameter will be acceptable. Regarding the lamp output power, we would like to also clarify that we will need at least a 350W NUV light source with capability for upgrades to lamps of higher power in the future. Question 3: Cut off filter - please confirm the spec on this filter. Answer: Requires an SU-8 Cut Off Filter. Question 4: On page 2 of the requirements, part c (Exposure and light source) item iii. #1 asks for 1000W NUV, #2 asks for 1000W DUV but item vi. Asks for 6" diameter beam with 350W NUV and spare lamp. I assume that: a. The system should be supplied with a 6" beam, 350W NUV lamp b. The system should be capable of upgrading to 1000W NUV in the future c. The system should be capable of upgrading to 1000W DUV in the future. d. Is this the correct interpretation of these specifications Answer: See previous response to Question 2 above. Question 5: On page 12 of the solicitation (FAR 52.212-3), it states that only paragraph b must be completed if the SAM registration is up to date. However, on page 17 (c), it states that "offerors must complete the following representations when the resulting contract will be performed in the United States or its outlying areas". Which is correct? Answer: Only paragraph b) must be completed if your SAM registration is up to date. Question 6: In page 2 of the requirements, item c ii says the system shall have up to 8" dia/square uniform beam size. This seems contrary to the Item 3.vi which asks for a 6" beam. An 89" dia/square beam would raise the cost significantly over a 6" diameter uniform beam. Which beam size is required? Answer: See previous response to Question 2 above. A 6" diameter uniform beam will be acceptable as we will be working with substrates up to 6" in diameter. Question 7: What is the intended use of the Microfluidics Module, how should it be operated and what are the required specifications for the module? Answer: The mask aligner should have the ability to be upgraded to include capabilities for contact liquid polymer processing for surface patterning. Question 8: Are three (3) different exposure lamps required (1000W Near-UV, 1000W Deep UV and 350W NUV)? Alternatively, is a single, 1000W lamp capable of supplying light in the specified range of 320nm - 450nm wavelength acceptable? Answer: See previous response to Question 2 above. Question 9: Are the stage movement ranges of +/-10mm X,Y and +/-0.5 degrees Theta based on pre-identified published machine specifications or actual requirements for the intended use of the machine? Answer: These are based on a comparison of published machine specifications from various manufacturers. See previous response to Question 1. Question 10: Is support of 8" substrates required for the intended use of the machine or will a lower cost solution supporting substrates up to 6" round or square be acceptable for the intended use? Answer: See previous response to question 2 above. A 6" diameter uniform beam will be acceptable as we will be working with substrates up to 6" in diameter.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/HHS/FDA/NCTR/1198704/listing.html)
- Place of Performance
- Address: Building 72/Room 3248, 10903 New Hampshire Ave, Silver Spring, MD 20993, Silver Spring, Maryland, 20993, United States
- Zip Code: 20993
- Zip Code: 20993
- Record
- SN04925888-W 20180519/180517230755-c554d6c069bbd5f253406a576b9b62c4 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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