Loren Data's SAM Daily™

SAMDAILY.US - ISSUE OF JANUARY 22, 2023 SAM #7726
SPECIAL NOTICE

59 -- NOTICE OF INTENT TO SOLE SOURCE-Open-load Reactive Ion Etcher

Notice Date

1/20/2023 11:46:04 AM
 

Notice Type

Special Notice
 

NAICS

334516 — Analytical Laboratory Instrument Manufacturing
 

Contracting Office

DEPT OF COMMERCE NIST GAITHERSBURG MD 20899 USA
 

ZIP Code

20899
 

Solicitation Number

NB688000-23-00519
 

Response Due

2/6/2023 12:00:00 PM
 

Point of Contact

Angela Hitt, Phone: 3034977305, Ian Robinson, Phone: 303-497-6126
 

E-Mail Address

angela.hitt@nist.gov, ian.robinson@nist.gov
(angela.hitt@nist.gov, ian.robinson@nist.gov)
 

Description

The National Institute of Standards and Technology (NIST) Acquisition Management Division intends to negotiate with Oxford Instruments America, Inc. located in Concord, MA on a sole source basis for an open-load reactive ion etching system, Oxford�s PlasmaPro 80 + PE. The statutory authority for this acquisition is 41 USC 3304(a)(1), as implemented under the authority of 41 U.S.C. 1901. An RIE system is a pattern transfer tool that uses a capacitive-coupled plasma to fabricate micron- and nano-scale structures in silicon, silicon-based dielectrics, and other materials, primarily using fluorocarbon-based compounds and other etching gases. This new RIE system will be used to minimize chemical cross-contamination, improve process repeatability, and add new NanoFab etching process capabilities. Based on the Government�s market research, only Oxford Instruments of America, Inc. can provide a commercially available product that meets the following Governments minimum requirements: A commercial developed system with 8 process gas lines and with the ability to switch the polarity of the electrodes, enabling the system to operate in both plasma etch (PE) and reactive ion etch (RIE) modes. Failure to meet these minimum requirements will limit the ability of the CNST NanoFab to meet the increasing demand to accommodate etching processes involving novel exotic materials, many of which are materially incompatible with the other etching systems in the NanoFab.� Unless a system with the plasma etch (PE) configuration is acquired, the need to perform etch processes with low sample bias voltages, which limits damage to critical underlying layers and materials, and the need for isotropic etching with similar low bias voltages will not be met. The full complement of 8 process gases, as specified, is required to satisfy the chemical requirements for etching materials including but not limited to silicon, silicon dioxide, silicon nitride, graphene, boron nitride, molybdenum, tantalum, tungsten, titanium, titanium dioxide, molybdenum disulfide and tungsten disulfide. Oxford Instruments America, Inc. is the sole manufacturer and distributor of the commercial equipment that meets the required minimum specifications.�� The North American Industry Classification System (NAICS) code for this acquisition is 334516 � Analytical Laboratory Instrument Manufacturing, with a small business size standard of 1,000 employees.�NIST anticipates negotiating and awarding a firm-fixed-price purchase order to Oxford Instruments America, Inc. for this requirement. A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government.� Interested parties that can demonstrate they could satisfy the requirement listed above for NIST must clearly and unambiguously identify their capability to do so in writing on or before the response date for this notice. This notice of intent is not a solicitation. Information submitted in response to this notice will be used solely to determine whether competitive procedures could be used for this acquisition. If competitive procedures are not used it is estimated that an award may be issued by fourth quarter 2023. Any questions regarding this notice must be submitted in writing via email to angela.hitt@nist.gov. All responses to this notice of intent must be submitted to angela.hitt@nist.gov no later than the date and time provided herein this posting.
 

Web Link

SAM.gov Permalink
(https://sam.gov/opp/0a704162555b423da3f04f43f83ceabb/view)
 

Place of Performance

Address: Gaithersburg, MD 20899, USA

Zip Code: 20899

Country: USA
 

Record

SN06569104-F 20230122/230120230102 (samdaily.us)
 

Source

SAM.gov Link to This Notice
(may not be valid after Archive Date)

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