Naval Research Laboratory, 4555 Overlook Ave, S.W., Washington DC 20375-5326

66 -- INSTRUMENTS AND LABORATORY EQUIPMENT SOL N00014-96-R-GP02 POC Geoffrey B. Pennoyer, Contract Specialist, Code 3220.GP, Contracting Officer, Kevin M. King (202) 767-2550. The Naval Research Laboratory (NRL) requires a mask aligner for use in contact photolithography. This unit will be installed in a research laboratory and used to manually process small lots of variously sized wafers, including but not limited to 2 inch (in.) diameter and 3 in. diameter wafers up to 0.025 in. thick, and pieces of wafers ranging in size from 3 x 3 x 0.3 millimeter to 2 x 2 x 0.025 in. The unit must support 4 in. square masks made of glass or quartz and provide soft, vacuum, and hard contact modes. The sample alignment system must allow for x, y and theta motion, and when combined with a vendor supplied normal field microscope/color closed circuit television, must allow alignment resolution to plus or minus 0.5 micrometer. An infra-red system must also be included to allow for backside alignment. It must correct for wafer-mask non-planarity. The system is to be supplied with mid-Ultraviolet (UV) (280 - 350 nanometers) source and optics having programmable exposure-time capability and beam uniformity of 5% or better over a 3 in. diameter. A meter is required to monitor UV beam intensity. The unit is to be mounted on a vendor- supplied vibration-isolation table in a clean-room environment at NRL in Washington, DC. Telephone requests for this requirement will not be honored. Requests for a copy of the solicitation must be submitted in writing to the Naval Research Laboratory, ATTN: 3220.GP, 4555 Overlook Avenue, S.W., Washington, DC 20375-5236, FAX No. (202) 767-5896 or (202) 767-6197. NRL Ref. No. GP02. RFP Closing Date 30 days after issuance. (0004)

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