National Institute of Standards & Technology, Acquisition & Assistance Division, Bldg. 301, Rm. B117, Gaithersburg, MD

B -- DEVELOPMENT AND PROCUREMENT OF PROTOTYPE SHARPNESS STANDARDS SOL 53SBNB6C9254 DUE 090696 POC Sandra Febach (301) 975-6326, FAX (301) 963-7732 The National Institute of Standards and Technology (NIST) intends to negotiate on a sole source basis with Texas Christian University (TCU) for development of prototype sharpness standards. The semiconductor material laboratory at TCU shall produce a series of etched silicon samples for a desired surface roughness standard in scanning electron microscopy. The samples will be based on porous silicon, etched biphasic glass or an etching defect called ''grass.'' A standard with the necessary nanoroughness will be fabricated in strict accordance with Government provided specifications. The period of performance will be from date of award through December 31, 1996. This is not a request for quotations; no solicitation document is available. NIST intends to negotiate on a sole source basis under the authority of FAR 6.302-1. See Numbered Notes 22 and 26. (0204)

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