Army Research Laboratory, ALC Procurement Division, ATTN: AMSRL-OP-SD-PC, 2800 Powder Mill Road, Adelphi, MD 20783-1197

66 -- 200 KEV JEOL 2010 FIELD EMISSION GUN SCANNING TRANSMISSION ELECTRON MICROSCOPE ANALYTICAL SYSTEM (STEMAS), 300 KEV JEOL 3010 STEMAS, AND REFURBISHMENT OF 200 KEV JEOL 2010 TEMAS SOL DAAL01-96-R-9373 DUE 091296 POC Linda Klein, Contract Specialist, (301) 394-3372, Carolyn S. Gonser, Contracting Officer, (301) 394-1604. The Army Research Laboratory (ARL) intends to procure for the acquisition of the following items (1) a 200 keV JEOL 2010 Field Emission Gun (FEG) Scanning Transmission Electron Microscope Analytical System (STEMAS); (2) the refurbishment of a 200 keV JEOL 2010 Transmission Electron Microscope Analytical System (TEMAS); and (3) a 300 keV JEOL 3010 Scanning Transmission Electron Microscope Analytical System (STEMAS). Requirements for each item are detailed below. (1) 200 keV JEOL 2010 FEG STEMAS - The Contractor shall ensure that the 200 keV JEOL 2010 FEG STEMAS meets the following stringent requirements: (a) Emitter must be Schottky but a thermal W (100) emitter must be available and presently capable for retrofit; (b) A gun area view window; (c) Guaranteed resolution (analytical polepiece) at Scherzer defocus of 2.3 nm and tilt of goniometer in polepiece must be +/- 40 degrees; (d) Orientation coincidence between image and diffraction pattern, i.e., no rotation of the diffraction pattern or image over the entire range of published camera lengths or over the magnification range 8000X to 800,000X; (e) Must have STEM BF/DF imaging, secondary electron and backscatter electron imaging modes; (f) The backscatter detector (in use/inserted) must not limit polepiece guaranteed tilt or resolution; (g) Resolution must be 2.0 nm in STEM and 1.0 nm in backscatter electron image mode; (h) Control of the illumnication angle via a convenient control that allows the angle to be changed while maintaining constant probe size, position and beam tilt; (i) A macintosh based energy dispersive spectroscopy (EDS) system with detector resolution of 137 eV; (j) EDS system must X-ray map via a point to point method; (k) System must have an objective aperture (useable with all polepieces) in a position such that when inserted there is no interference with EDS signal during analysis; and (l) System must have digital image processing and printing capabilities. (2) Refurbishment of 200 keV JEOL 2010 TEMAS - The Contractor shall ensure that refurbishment of the 200 keV JEOL 2010 TEMAS meets the following stringent requirements: (a) Insulating gas in the high tension tank and gun chamber must be replaced with SF6 and a JEOL-II emitter installed; (b) Installation of a macintosh based energy dispersive spectroscopy (EDS) system, capable of detecting Boron, with detector resolution of 137 eV; and (c) EDS system must x-ray map via a point to point method. (3) 300 keV JEOL 3010 STEMAS - The Contractor shall ensure that the 300 keV JEOL 3010 STEMAS meets the following stringent requirements: (a) Two interchangeable polepieces: high resolution polepiece with 0.17 nm guaranteed resolution at Scheerzer defocus and specimen tilt angle +/- 30 degrees and analytical polepiece with 0.20 nm guaranteed resolution at Scherzer defocus and specimen tile angle +/- 40 degrees; (b) Orientation coincidence between image and diffraction pattern, i.e., no rotation of the diffraction pattern or image over the entire range of published camera lengths or over the magnification range 8000X to 600,000X (analytical) and 10,000X to 1,000,000X (high resolution); (c) Must have STEM BF/DF imaging, secondary electron and backscatter electron imaging modes; (d) The backscatter detector (in use/inserted) must not limit polepiece (high resolution and analytical) guaranteed tilt or resolution; (e) Resolution must be 0.5 nm (high resolution polepiece) and 0.7 nm (analytical polepiece) in STEM and 4.0 nm in backscatter electron image mode; (f) Control of the illumination angle via a convenient control that allows the angle to be changed while maintaining constant probe size, position and beam tilt; (g) A macintosh based energy dispersive spectrocopy (EDS) system with detector resolution of 137 eV; (h) EDS system must x-ray map via a point to point method; (i) System must have an objective aperture (useable with all polepieces) in a position such that when inserted there is no interference with EDS signal during analysis; and (j) System must have digital image processing and printing capabilities. It is intended to award a contract to JEOL USA, Inc., 11 Dearborn Road, Peabody, MA 01861-6043, pursuant to FAR 6.302-1. ARL's material characterization needs depend critically on the stringent requirements listed above. Many of the stringent requirements listed above can be met only be JEOL USA, Inc. In addition, refurbishment of the 200 keV JEOL 2010 TEMAS can be accomplished only by the original manufacturer (JEOL USA, Inc.) since all the software, hardware and schematics needed to install, integrate, operate and power systems optics, JEOL-II emitter gun, JEOL-II SF6 HT tank, electronic and spectroscope entities (after and before refurbishment) is proprietary only to JEOL USA, Inc. Market research has demonstrated that JEOL USA, Inc. is the only vendor capable of meeting the Government's minimum needs. Firms that recognize and can provide the required items described above are encouraged to identify themselves and give written notification to the Contracting Officer, and provide supporting evidence to the Contracting Officer, within fifteen (15) calendar days after date of this publication. The final determination by the Government not to open this requirement to competition, based on any information provided, is solely within the discretion of the Government. All responsible sources may submit a bid or proposal which will be considered by the Agency. No telephone requests will be honored. (0211)

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