Loren Data Corp.

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COMMERCE BUSINESS DAILY ISSUE OF NOVEMBER 5,1996 PSA#1715

Army Research Laboratory, ALC Procurement Division, ATTN: AMSRL-CS-AL-PC, 2800 Powder Mill Road, Adelphi, MD 20783-1197

66 -- ELECTRON-BEAM EVAPORATION SYSTEM SOL DAAL01-96-R-9385 DUE 110896 POC Patricia States, Contract Specialist, (301) 394-4348, Carolyn S. Gonser, Contracting Officer, (301) 394-1604. This procurement is for the purchase of an Electron-Beam Evaporation System. This is a sole source procurement to Denton Vacuum, Inc., Moorestown, NJ, since they are the only source that makes a multi-metal electron beam evaporation system that can meet the requirements of the Government. This system must have removable graphite source pocket liners, capable of performing the following deposition cycle on BOTH sides of a 6 in x 6 in. (15 cm. x 15 cm.) substrate during a single pump down, while the substrate is heated to 300 degrees C: 200 nm. +/- 10% of molybdenum at ) 1 nm./sec. (single metal evap.); 200 nm. +/- 10% of molybdenum and gold at )2 nm./sec. (co-evap.); 1000 nm. +/- 10% of gold at )5 nm./sec. (single metal evap.). The co-evaporation of molybdenum and gold must be in a 1:1 atomic ratio and there must be a provision for splatter free deposition. The vacuum system must be capable of producing a pressure of less than or equal to 1 x 10 (to the ''-8'' power) torr while the substrate is heated to 250 degrees C. Thermocouple and ionization vacuum gauges and controls must be provided. Stainless steel internal fixturing must be provided which is capable of holding the existing 6 in. x 6 in. x 0.5 in. (15 cm. x 15 cm. x 1.3 cm.) substrate holder and sliding mask assembly. The fixturing must be capable of securing the substrate for an initial deposition cycle, then sliding the mask and performing another deposition, rotating the substrate holder one-half turn so that an identical deposition cycle can be performed on the reverse side of the substrate, without breaking vacuum. The substrate must be located such that the film thickness variation is less than +/- 5% of the thickness measured by the thickness monitor. Heater, temperature sensor, and temperature controller must be provided to heat the substrate to a selectable set-point up to 300 degrees C and to control the temperature to +/- 10 degrees C, without compromising the welds or seals on the thickness monitor sensors. A shutter must be provided between the substrate and the sources to allow pre-melting of the metals and for manual control of the film thickness. Automatic rate and thickness control for each metal must be provided. The system must possess a control system capable of performing system pumpdown, film deposition, sample holder articulation, and system venting under computer control. The system must also be able to monitor and store process parameters. SIZE: The evaporation system must be configured to operate in a class 100 clean-room with 7 ft. high ceilings. All responsible sources may submit a bid or proposal which will be considered by the Agency. No telephone requests will be honored. See Numbered Note(s): 22. (0306)

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