National Institute of Standards & Technology, Acquisition & Assistance Div., Bldg. 301, Rm B117, Gaithersburg, MD 20899

66 -- LIQUID DELIVERY-CVD SYSTEM SOL 52SBNB7C1096 DUE 041497 POC Contract Specialist, Keith Kennedy, (301) 975-6325/ Contracting Officer, Lisa Jandovitz, (301) 975-6344 WEB: NIST Contracts Homepage, http://www.nist.gov/admin/od/contract/contract.htm. E-MAIL: NIST Contracts Office, Contract@nist.gov. The National Institute of Standards and Technology (NIST) intends to acquire from Advanced Technology Materials, Inc. (ATMI), one liquid delivery-chemical vapor deposition (CVD) system to fabricate ferroelectric oxide films as part of the Thin Film Measurements Program within the Ceramics Division. The liquid delivery system must be capable of volumetrically mixing up to three independent metalorganic liquids, metering the mixture, transporting the mixture to a vaporizer and then flash evaporating the mixture to supply a gas to an existing CVD reactor. The major components of the integrated system are: source reservoirs for the metalorganic liquids, a mixing manifold, a metering pump, a vaporizer and a computer with appropriate interfaces. The specifications of these and other components are: A. Fully integrated and automated system for metering, mixing and vaporizing metalorganic liquids for chemical vapor deposition of ferroelectric oxide films. B. Capability to mix up to three independent liquid sources. C. Integrated system must include the following: 1.Three source reservoirs with level sensors having several different level indicators; capability to add a fourth reservoir onsite at NIST, 2.Valve manifolds to permit pressurization, purge, evacuation and refill of process lines, 3. Regulation of the pressurization gas, 4. Precursor mixing manifold for mixing up to four separate liquid sources, 5. A single vaporizer for the liquid source mixture ( " diameter min.) with operating temperatures up to 350 C for 1-6 h and operating pressures from 0 to atmospheric pressure, 6. Run/vent manifold downstream of the vaporizer that can maintain temperatures up to 250 C, 7. Capacitance manometer on the carrier gas line to the vaporizer to monitor pressure changes that would indicate the need to clean the vaporizer, 8. A computer (IBM compatible) and software (unspecified) to perform run, flush, evacuate, leak pressure test, refill and vent operations. D. Capability to meter metalorganic liquids with flow rate accuracy of at least 4% at 1 cc/min. E. Capability to mix up to four liquid streams with a compositional accuracy upon mixing of at least 2% (absolute) at 5 cc/min and a precision of at least 1 % (absolute) at 5 cc/min. F. Capability to flush the vaporizer with a liquid solvent to remove residual metalorganic liquids between runs (prevents vaporizer clogging and extends time between vaporizer cleaning events). G. Controllable parameters to include: liquid flow rate of each source, mixing fractions of each source, vaporizer temperature, pressure in liquid lines, run time, purge time, vent time, flush time, evacuate time and pressurize time. H. Indicators or displays to show: levels of liquid sources, vaporizer temperature, flow rates and mixing fractions of each source, pump status (on/off), valve status, line pressure, vaporizer pressure, currently active operation (run, vent, flush, purge, evacuate, pressurize). I. On-site installation support for integration of the system into our existing CVD reactor, hook up of the services (electrical, vacuum, gases), testing of the system and training of two operators (one week installation/testing/training session). J. Technical support by telephone (weekdays 9 am to 5 pm) for the liquid delivery system (hardware and software), metalorganic source chemicals, and metalorganic chemical vapor deposition processing of BaTiO3 films. K. One year warranty on all parts except those that are consumable or require maintenance as a result of normal operating conditions. L. Operating manual covering description of system components, instructions for installation of the system, instructions for operating the system (hardware and software), and instructions for performing routine maintenance events on the system. This notice is not a request for competitive proposals. NIST intends to solicit one source under authority of FAR 6.302-1 because NIST believes that ATMI is the only responsible source that can supply a liquid delivery-CVD system capable of volumetrically mixing up to three independent metalorganic liquids, metering the mixture, transporting the mixture to a vaporizer, then flash vaporizing the mixture to supply a gas to the CVD reactor. The major components of the integrated system are: source reservoirs for the metalorganic liquids, a mixing manifold, a metering pump, a vaporizer and a computer. However, NIST shall consider all capability statements received within 45 days after the date of this synopsis. Interested parties may identify their interest and capability to respond to the requirement by submitting a written capability statement. The capability statement must provide adequate information on supplying this system, and qualifications needed to produce this system. NIST must receive all of these documents to determine whether to open this requirement for competition. See Numbered Note 22. (0062)

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