Assistant Commander For Contracts, Naval Air Systems Command, Air 2.5.3 Bldg 3189 Unit 8, Naval Air Station, Patuxent River, MD 20670-5449

A -- ELECTRON BEAM (E-BEAM) PATTERN GENERATION TOOL SOL N00019-94-C-0035/MOD POC Lisa Abell, Contract Specialist, (301) 342-4658/9 The Naval Air Systems Command (NAVAIR) intends to procure, under existing Contract N00019-94-C-0035 with Lockheed Martin Federal Systems located in Manassas, Virginia, the development of an Electron Beam (E-Beam) pattern generation tool. Lockheed Martin is working in conjunction with IBM and Motorola, the Collaborative Association for Proximity X-Ray Lithography, for the Microlithographic Mask Development (MMD) program. Lockheed Martin shall be responsible for the development of the requirements, specifications, hardware and software for a direct write E-Beam pattern generation tool for use in the MMD mask facility in Burlington, Vermont. This tool shall be capable of meeting the requirements for X-Ray masks having minimum design groundrules of 130nm and below. Lockheed Martin is uniquely qualified to develop the tool requirements and specifications, and to manage the development and procurement, subsequent integration and qualification of this tool within the required timeframe. Lockheed Martin has extextensive background experience in the development and application of world class E-Beam tools to mask manufacturing and will build on this capability during this effort. Lockheed Martin maintains the unique capability as both a world class user and provider of E-Beam tools. See Numbered Note(s): 22 & 26. (0071)

Loren Data Corp. http://www.ld.com (SYN# 0001 19970314\A-0001.SOL)