Naval Research Laboratory, 4555 Overlook Ave. S.W. WASHINGTON,D.C. 20375

61 -- ELECTRODELESS ECR ELECTRON CYCLOTRON RESONANCE PLASSMA ION SOL N00173-98-Q-0036 POC Darlene Copp, Purchasing Agent, (202) 767-2374 Fax (202) 404-8158. Naval Research Laboratory has a requirement for one ELECTRODELESS ECR ELECTRON CYCLOTRON RESONANCE PLASMA ION SOURCE AND POWER SUPPLY FOR REACTIVE ION ETCHING with the following specifications: UHV compatible and bakeable to 200c 4.5" OD conflat flange, 10^-2 to 10^-5 torr operating range compatible with CH4 and H2 and AR gas flow 5-20 sccm, Microwave power adjustable 50-200W, Beam flux >10^16/CM2, norminal 2" diameter beam working area 12" in vaccuum length. Gas manifold to supply ECR source including: 3 mass flow controllers compatible with CH4, H2, and Argon. Air operated downstream isolation valves suitable for automatic control. Oral request for RFQ package will not be accepted. See Numbered Note(s): 1. (0064)

Loren Data Corp. http://www.ld.com (SYN# 0325 19980309\61-0005.SOL)