Naval Research Laboratory, Code 3220, 4555 Overlook Ave. S.W., Washington, D.C. 20375-5326

66 -- UV MASK ALIGNER SOL N00173-98-R-WC01 POC Wayne Carrington, Contract Specialist, Code 3220.WC, (202) 767-0393, Kevin King, Contracting Officer WEB: click here, http://heron.nrl.navy.mil/contracts/home.htm. The Naval Research Laboratory (NRL) has a requirement for a mask aligner for use in UV photolithography. The unit will be installed in a research cleanroom and used to process wafers sized from 2 in. to 6 in. in diameter (thickness to .05") and square substrates from 2x2 in. to 6x6 in., with thickness of 1 to 3mm. The unit must support 3", 5" and 7" square masks made of glass or quartz and allow proximity, soft, vacuum and hard contact modes. The sample system must allow for x, y and theta motion and with a contractor supplied microscope/CCTV-frame grab system allow frontside/backside alignment, with a resolution of + 0.5 micron. The system must be equipped with correction for mask/substrate nonplanarity. The system must be equipped with correction for source and optics, with the option to upgrade to mid UV (280-350 nm). The system must have programmable exposure-time capability and beam uniformity of better than 5% over a 6 in. diameter. A meter is to be provided to monitor UV intensity. The system must be vibration isolated and is to be installed by the contractor in a cleanroom environment at NRL. Additional requirements will be provided in the solicitation. NRL uses Electronic Commerce (EC) to issue RFPs and amendments to RFPs. This solicitation and any amendments to it will be available via the internet at the URL address shown below. Paper copies of the RFP will not be provided (0064)

Loren Data Corp. http://www.ld.com (SYN# 0353 19980309\66-0016.SOL)