Commander, Naval Air Warfare Center Weapons Division, Code 210000D, 1 Administration Circle, China Lake, CA 93555-6100

66 -- SCANNING PROBE MICROSCOPE SOL N68936-99-R-0011 DUE 122898 POC Joanne Shepter, Contract Specialist, (760) 939-7651, or L. Dell Hledik, Contracting Officer, (760) 939-3772 The Naval Air Warfare Center Weapons Division, China Lake, CA intends to enter negotiations, on an other than full and open competition basis, with Digital Instruments, Inc., Santa Barbara, CA, to procure one Nanoscope IIIa Scanning probe Microscope (SPM) with the required accessories. The intended use of this equipment is to characterize the surface properties on polar polymer films for electro-optic devices, polymer films for chemical sensor devices, and chemical vapor deposited (CVD) films. Equipment included in the contract will be 1) NanoScope IIIa Scanning Probe Microscope Station Model NS3A-01, 2) Dimension 3100 SPM, Model D3100-120P, 3) Dimension AFM Microscope Head, Model DAFMF, 4) 6-inch Vacuum Chuck, Model DSC150, 5) Silicon Nitride NanoProbes, Model DNP-1, 6) Olympus TappingMode Etched Silicon Probes, Model OTESPA7-1, 7) Extender Electronics Module, Model PHASE-D01, 8) Cantilever Holder for Scanning in Fluids, Model DTFML, 9) NanoIndenting/Scratching Option, Model DNISO, 10) Integrated Acoustic / Isolation system, Model IS5K-2, 11) Electronics Console, Model ELCON, 12) Special Production and Handling Services, Model CLNRMWIP, 13) Tip Evaluation Option, Model TEVAL, 14) STM Tip Holder, Model DSTM, and 15) Three days Installation and/or Training, Model ITCS3, and includes options for the following items: 1) Additional Olympus TappingMode Etched Silicon Probes, Model OTESPAW, 2) NanoTips STM Tips, Model DPT, and 3) NanoTips STM Tips, Model DTT, 4) Diamond-tipped Nano-indenting probes, Model PDNISP, 5) Signal Access Module, Model SBOB, 6) Two days Installation and/or Training, Model ITCS, 7) Cleanroom Operation Manuals, Model CRMAN3, and 8) Dye-Sublimation Color Printer Model PH450. Installation and training will also be required. The system provides a Tapping mode AFM operation whereby the probe is moved laterally relative to the surface of the sample, and simultaneously, is repeatedly lifted off the surface and then returned to the surface. The repeated lifting avoids the probe dragging across the surface of the sample and thereby avoids damage to the probe and the sample. This AFM mode allows high resolution true surface measurement by contacting the sample while minimizing shear force, sample compression and stick-slip motion. This permits the measurement of our soft samples and those that interact with the tip by electrostatic or meniscus force. The system provides the capability of Contact & Tapping Mode AFM imaging in a fluid cell. This capability may allow the in situ monitoring of the adsorption of polymers to substrates thereby providing faster determination of optimum processing parameters. Also, this capability will allow comparison of wet and dry films. The system provides phase contrast imaging whereby the probe is oscillated, contacts the surface of the sample penetrating the adsorbed liquid layer so that the surface is imaged and lifts from the sample surface. As the topography image (change in cantilever oscillation amplitude) is acquired/displayed, the phase change of the cantilever oscillation is also simultaneously acquired/displayed. The system provides a patented mode of force imaging where the topography is determined on a continuous first pass over a scan line in which the topography is measured and stored, and a second parameter, which may not be related to topography such as magnetic field, is determined on a second pass, and the stored topography from the first pass is used to track the surface during the second measurement. Operating parameters may be changed on the two passes. This is an important capability because it provides a clear view of which topographic features are correlated with the second parameter; for example, a topographic feature such as a step edge might be correlated to a change in surface potential across a sample. The system provides unique AFM nano-indenting and scratching modes with a diamond probe/cantilever, cantilever/scanner mount and analysis software. These modes indent or scratch the sample surface then image with the tapping mode AFM operation.The system provides nanoindenting with a cantilever based AFM system and tapping mode imaging. This feature is needed to measure hardness of CVD films. This SPM will provide critical information necessary to the progress of ongoing Navy projects, namely, the development of room temperature processes for the production of polar polymer films and the chemical vapor deposition of inorganic coating and semiconductor materials. Characterization at nanoscale dimensions is necessary for continued progress of those research projects. Responses to this intent to solicit, other than Digital Instruments, should be submitted in writing to Naval Air Warfare Center Weapons Weapons Division, no later than 30 days from the date of this synopsis and shall address your experience and capability to produce the SPM with the needed capabilities and can be delivered three months after award. See Note(s): 22. Posted 11/10/98 (I-SN269863). (0314)

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