NASA/Goddard Space Flight Center, Code 215, Greenbelt, MD 20771

70 -- NANOMETER PATTERN GENERATION SYSTEM SOL 553-23886-929 DUE 050499 POC Maria D. Furr, Contract Specialist for Simplified Acquisition, Phone (301) 286-3723, Fax (301) 286-1720, Email Maria.D.Furr.1@gsfc.nasa.gov -- Mary E. McKaig, Contract Specialist for Simplified Acquisition, Phone (301) 286-4240, Fax (301) 286-1720, Email Mary.E.McKaig.1@gsfc.nasa.gov WEB: Click here for the latest information about this notice, http://nais.nasa.gov/EPS/GSFC/date.html#553-23886-929. E-MAIL: Maria D. Furr, Maria.D.Furr.1@gsfc.nasa.gov. NASA/GSFC plans to issue a Request for Quotation (RFQ) for a Nanometer Pattern Generation System (v7.6). This procurement is being conducted under the Simplified Acquisition Procedures (SAP). NASA/GSFC intends to purchase the items from JC Nabity Lithography Systems. Nabity Lithography Systems is the only vendor of the Nanometer Pattern Generation System (v7.6) in the United States. Nabity fulfills GSFC's minimum needs as follows: A pattern sign capable to define programs to generate complex patterns using high level CAD commands from within the CAD program which are then stored in the native pattern format of the lithography system. The system must include: arbitrary filled polygons with up to 200 vertices, arbitrary lines and circular arcs written with the beam moving parallel to the line length or tangent to the arc; conversion utilities from the following CAD formats: DXF, GDSII, CIF, HPGL, ASCII, and IGES; arbitrary filled polygons that scan all lines filling the polygon parallel to each other; patterns written in a true vector mode that always utilizes the full 16-bit resolution of the DAC's and alignment program with accurate alignment for multi-level lithography. Both automatic and manual alignment modes must be available. Facturing of large patterns possible in an automated mode. Facturing mode able to minimize the number of pattern elements which must be broken into two or more sub-fields. Automated beam reading feature capable of making periodic readings of the beam. Must be capable of exposing individual points with exposure times as short as 0.25 microseconds when using a fast beam blanker. Must be compatible with scanning electron microscope Cambridge 240. Interested firms have 15 days from the publication of this synopsis to submit in writing to the identified point of contact, their qualifications/capabilities. Such qualifications/capabilities will be used solely for the purpose of determining whether or not to conduct this procurement on a competitive basis. Responses received after the 15days or without the required information will be considered nonresponsive to the synopsis and will not be considered. A determination by the Government to not compete this proposed effort on a full and open competitive basis, based upon responses to this notice is solely within the discretion of the Government. Oral communications are acceptable in response to this notice. All responsible sources may submit an offer which shall be considered by the agency. An Ombudsman has been appointed. See Internet Note "B". Posted 04/13/99 (D-SN319856). (0103)

Loren Data Corp. http://www.ld.com (SYN# 0664 19990415\70-0029.SOL)