Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550

A -- LAWRENCE LIVERMORE NATIONAL LABORATORY SEEKS INDUSTRIAL PARTNERS TO COMMERCIALIZE OPTICS TECHNOLOGIES IN SUPPORT OF DEEP ULTRAVIOLET (UV) LITHOGRAPHYAVIOLET SOL 00-024 DUE 051900 POC Industrial Partnerships and Commercialization (925) 423-3139 The Lawrence Livermore National Laboratory (LLNL), operated by the University of California under contract with the U.S. Department of Energy, is seeking collaborators in the commercialization and further development of optics and metrology technologies that can be applied in the field of Deep UV Lithography (DUVL). Deep UV Lithography is the current leading edge technique for manufacturing memory and logic integrated circuits and is likely to be used for fabricating features with critical dimensions of less than 100 nm. It is anticipated that the next generation of DUV lithographic tools will employ a step and scan configuration using 157 nm excimer lasers with a bandwidth of about 1 picometer. Key technical challenges for future DUVL systems include the design, fabrication, simulation, and testing of optical projection systems that are used for imaging the reticle onto the wafer. The optical projection system must meet stringent imaging requirements for low levels of wavefront aberration, distortion,and flare while maintaining a high level of optical system stability. LLNL is seeking industrial partners in applying its optics technologies to the design, manufacture, and characterization of DUVL optical projection systems. Potential areas of interaction include: 1) the optical design of DUV optical projection systems compatible with commercially-available excimer laser light sources; 2) the development of new optical materials for use with excimer laser illumination; 3) the metrology of assembled optical systems and individual optical components; 4) the coating of optical elements; 5) the design of the mechanical housing and hardware for mounting and actuating the optical elements; 6) the alignment of optical systems; and 7) the simulation of the optical system including the application of detailed electro-magnetic models describing the interaction between the illumination and reticle structures. LLNL has a long history of developing optical systems in support of its internal programs as well as in partnerships with industry. Collaborators are sought with a demonstrated expertise in developing optical systems for DUV Lithography. Successful collaborators will have an established history in delivering optical systems that have been integrated into lithographic production systems. Avenues for collaborations may include work for others (WFO), or Cooperative Research and Development Agreements (CRADAs). Any collaboration must include a funds-in component to LLNL to support the design, fabrication, metrology, or analysis of a DUVL imaging system or its optical components. To ensure consideration, interested parties must respond in writing to LLNL by May 19, 2000 and provide the following information: (1) the name and address of the organization; (2) the name, address, telephone number, fax number, and email address of a point of contact; (3) documentation as to the corporate importance of DUV lithographic imaging systems to the company; (4) a roadmap indicating the company's past development of lithographic imaging systems, its current imaging systems, and its anticipated introduction of future DUV imaging systems, such as for 157 nm lithography. Statement of interest should be sent to Industrial Partnerships and Commercialization Office, Lawrence Livermore National Laboratory, P.O. Box 808, L-795, Livermore, CA 94551. Attention: CBD-00-024 (DUVL). Posted 04/21/00 (W-SN447700). (0112)

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