NASA/George C. Marshall Space Flight Center, Procurement Office, Marshall Space Flight Center, AL 35812

66 -- PROCUREMENT OF A SECONDARY ION MASS SPECTROSCOPY (SIMS) SOL 8-1-0-E3-C8525 DUE 080900 POC Gloria J. Coffey, Contract Specialist, Phone (256) 544-9187, Fax (256) 544-8688, Email gloria.coffey@msfc.nasa.gov -- Michael R. Sosebee, Contracting Officer, Phone (256) 544-0415, Fax (256) 544-8688, Email michael.sosebee@msfc.nasa.gov WEB: Click here for the latest information about this notice, http://nais.msfc.nasa.gov/cgi-bin/EPS/bizops.cgi?gr=D&pin=62#8-1-0-E3-C8525. E-MAIL: Gloria J. Coffey, gloria.coffey@msfc.nasa.gov. NASA/MSFC plans to issue a Request for Quotation (RFQ) for a Secondary Ion Mass Spectroscopy (SIMS) to include the following: SECONDARY ION MASS SPECTROMETER (SIMS) MAGNETIC SECTOR TYPE WITH DETECTION LIMITS FROM PPM TO PPB RANGE AND 10 (12) TO 10 (16) ATOMS/CM(3). DEPTH RESOLUTION30-300 A. LATERAL RESOLUTION > 30UM (DEPTH PROFILING) AND 1 UM (IMAGE MODE). ION MICROANALYZER WITH PRIMARY BEAM MASS FILTER, DUOPLASMATRON SOURCE, HIGH BRIGHTNESS CESIUM MICROBEAM SOURCE, OXYGEN FLOODING ATTACHMENT, SCANNING ION IMAGE DISPLAY, CLOSED LOOP WATER-COOLED CHILLER, LINE VOLTAGE POWER CONDITIONER (TRANSFORMER AND FILTER)._REF. CAMECA: IMS 6F, PBMF, DUO, CMS, OFM, SID, CHILW-6F, 2014. Quantity: 1 each. Purchase Specification for a Secondary Ion Mass Spectrometer: The following is a specification for a Cameca IMS 6f Dynamic Secondary Ion Mass Spectrometer (SIMS) which is required to provide precise bulk impurity analysis on the order of parts per million, and in some cases parts per billion for all elements for metallic materials as well as insulators. The instrument shall be equipped with devices such that the samples can be imaged with high spatial resolution and the impurity elements could be mapped on the images. (1) System Description The SIMS system as described in the following paragraphs must be a new product being manufactured solely or partly by the vendor. No component of this system shall be old, refurbished, repossessed or a part of any sales demonstration. The system shall have ion source(s) for the generation of primary ions. It shall have sample loading, holding and manipulation devices, and finally, a secondary ion collection, processing and measuring device(s). The system shall have vacuum pumps and gauges as well as interlock system for protection from vacuum and/or utility failure. All electronics, sample translations and vacuum systems shall be interfaced with an on board computer for unattended operation. 1.1. ION SOURCE: The system shall have the following types of ion sources: Duoplasmatron and Cesium. Adequate provisions shall be made for the addition of a second primary column for a gallium source Liquid Metal Ion Gun (LMIG) not included in the original configuration. The ion source(s) shall be so chosen so that the removal of materials from the surface of the sample for chemical analysis shall be adequate to provide detection limits as well as the spatial resolution as provided in the system capability section. 1.1.2 A duoplasmatron capable of producing O2+, O -, Ar + positive ion beams with accelerating voltages adjustable between 2 and 15 kV (or more) for positive ions and between -2 to -10kV(or more) for the negative ions. 1.1.3 A surface ion source such as a high intensity cesium source with scanning capability for both microanalysis and imaging capability. 1.2 CHARGE NEUTRALIZER: The system shall have adequate arrangement for charge neutralization for analyzing insulators. The charge neutralization shall be carried out in an acceptable manner such that the peak positions and intensity arenot effected. 1.3 VACUUM SYSTEM: The SIMS system shall maintain a high vacuum level at the analytical chamber during operation. The vacuum level shall be of the order of 10-9 or better. This vacuum level shall be generated using pumps such as diffusion/turbo-molecular, cryogenic, ion or sublimation pumps without emission of any gases or organic matter affecting analysis. Several of these pumps are to be placed at strategic locations for differential pumping and superior performance of the system. It shall have the following characteristics: 1.3.1 It shall be fully automatic. The pumping down or venting procedure shall work in a sequential manner automatically by operation of a single button, key stroke or menu command. 1.3.2 The vacuum system, analytical and high voltage electronics all shall be interlocked for complete system protection during any utility or vacuum failure. 1.3.3 The system must provide one or more real time display of the vacuum levels at one or more locations. 1.3.4 The analytical chamberand columns shall have provisions for dry nitrogen back-fill. 1.3.5 The system shall have fore-line trap(s) to prevent oil vapors from mechanical pumps to enter in to the rest of the vacuum system. 1.3.6 There must be an automatic gun isolation valve that separates the gun assembly and column during sample exchange. 1.4 SPECIMEN CHAMBER AND STAGE: The main analytical chamber shall have the following. 1.4.1 An attached sample preparation chamber with sample heating capability for degassing. 1.4.2 A fast sample-loading device, with preservation of the ultra-high vacuum levels at the analytical chamber, as well as, efficient pumping devices (both for sample preparation as well as analytical chamber) for quick pump-down. 1.4.3 Multiple translation, tilt and rotation sample stage with computer control. This shall allow storage of sample positions and automatic sample positioning when the position is recalled. 1.4.4 The stage shall be capable of eucentric rotation with computer control and capable of attaining a minimum speed of 1 rpm. 1.4.5 The system shall have a wide field optical microscope for sample viewing and positioning. 1.4.6 Due to a wide range of materials planned for analysis in this system, the system shall have in-build design to minimize contamination. Also, the main chamber shall have devices in place to clean/replace the ion paths to reduce contamination and memory effects. 1.4.7 The chamber shall have sufficient number of unused ports and columns for sample viewing and future upgrading. 1.5 SECONDARY ION DETECTOR: The secondary ions emanating from the sample surface shall pass through an efficient secondary ion collection and detection device for efficient ion analysis. It shall consist of ion extraction, transfer optical system, mass spectrometer and ion detection devices. The system shall have at least or higher 30% transmission of secondary ions. 1.6 OPERATIONAL CONTROL: The entire system may be microprocessor controlled. The operator shall be able to adjust important voltages and supplies to various units for the optimum system operation. These settings shall be storable and recallable by the operator for repetitive operations. 1.6.1 The data system shall be a computer or a workstation with its own monitor and sufficient hardware and memory. 1.6.1.2 It shall also contain a data back-up device and have networking capability specifically 100-base-T network. 1.6.1.3 The microprocessor for the computer shall have a minimum speed of 400MHz. 1.6.1.4 The monitors shall have 19 inches or more viewing area. 1.6.1.4 The hard drive shall have at least 10Gbytes of memory with sufficient RAM (512Mb) 1.6.2 The software shall be user friendly with data acquisition programs for depth profiling, mass spectra, isotope ratios, energy spectra and line scans. For each of these analyses, operational control options, such as sample HV control, beam blanking etc. shall be computer controlled. 1.6.2.1 In addition, the software shall be menu driven for routine functions, and shall have data reduction, processing and utility programs. 1.7 DOCUMENTATION: The system shall come with accurate operation, maintenance, and software manuals. The manuals shall include figures, drawings, parts lists and circuit schematics to facilitate repair and in-depth understanding of the equipment operations. Operating and service manuals shall be delivered complete and accurate for the system that is installed. In lieu of a complete set of on-site service manuals, the service engineer shall have access to a complete set of service manuals and technical support. 1.8 BAKE-OUT: The system shall have an easy-to-use bake-out device for complete system bake-out. 1.9 INSTALLATION: The vendor shall provide competently trained service engineers to install and certify acceptable operation of the system at MSFC. The system shall be completely installed at MSFC by the vendor. It shall come with all components and the connecting cables and conduits for complete assembly and acceptance tests. Following assembly, the critical performances/analyses shall be demonstrated. Vendor personnel installing and testing the new equipment must obtain advance clearance from MSFC security for access. 1.10 TRAINING: The vendor shall train prospective MSFC operators on-site for at least three days after installation is completed, and the SIMS operational capability is certified through verification testing. Videocassette training and computer courses may be used in conjunction with the preliminary on-site training. Following this preliminary training, in-depth training on the instrument must be arranged by the vendor either on-site or at a remote site for at least two MSFC employees. Personnel providing training shall be certified and must clear in advance with security for access onto MSFC. 1.11 WARRANTY: The vendor shall provide, with their proposal, a copy of their standard warranty applicable to the instrument and accessories supplied under this procurement. 1.12 MISCELLANEOUS: The following spare parts shall be provided in addition to delivery of the normal system components: 1.12.1 A nominal two year supply of spare replacement filaments as appropriate for the each specific type of ion gun(s). 1.12.2 A supply of specimen holders sufficient to begin operation of the equipment. 1.12.3 All specialized tool kits necessary for general maintenance of the SIMS shall be provided. 1.12.4 All hardware components must be off the shelf items that have been successfully used in other systems. Prototypes are not acceptable. 1.12.5 All software and firmware components shall be the latest release version. Beta releases are not acceptable. 1.12.6 If chilled water is required for operation of various system components, any necessary water chiller(s) shall be provided by the vendor. Any supplied water chillers shall be air cooled. 1.12.7 A power conditioning unit with both visual and audible alarms shall be provided for voltage stability and surge protection by vendor if one is required by the vendor. 1.12.8 All cables, connectors, fittings, tubing, and other devices or equipment needed for installation and operation of the delivered SEM system, must be supplied by the vendor. 1.13 POTENTIAL UPGRADES: The system shall be designed from inception to include but not limited to the installation of the following upgrades: 7 an ion source LMIS 7 oxygen flooding attachment 7 digital image processing 7 secondary electron imaging 7 and others that are available for the model. (2) System Capability The system as described above shall be able to perform Dynamic SIMS on materials to provide elemental bulk impurity analysis at parts per million to parts per billion levels (depending on the element) in an accurate manner. It shall be able to perform both positive and negative SIMS analysis as well as depth profiling, as needed. The following detection limits (atoms per cm3) in silicon matrix are given as guidelines for its performance. Hydrogen -- 5 x 10 (16 power) Lithium -- 1 x 10 (13 power) Sodium -- 1 x 10 (13 power) Boron -- 5 x 10 (12 power) Chromium -- 2 x 10 (13 power) Iron -- 6 x 10 (14 power) Copper -- 1 x 10 (14 power) The system shall possess high, mass transmission (at least 30%) and range, high mass- resolution (typically around 4000 or better), and high abundance sensitivity (3 x 10 (-9 power) or better.) For ease of operation and accurate analysis of insulators and ceramic materials, the system shall have a suitable charge compensation device. The system shall have excellent ion and/or electron imaging capability such that elemental impurity mapping can be performed with good resolution. A lateral resolution of 500 nm, and a depth resolution of 30nm or better is typically expected. The equipment is being procured for a failure analysis laboratory where the time element is very critical. The system must be able to provide bulk analysis of prepared samples within a reasonable time frame. This procurement is being conducted under the Simplified Acquisition Procedures (SAP). NASA/MSFC intends to purchase the items from Cameca Instruments Inc., 204 Spring Hill Rd., Trumbull, CT 06611. Thisrecommendation is made pursuant to FAR 13.106-1(b)(1). The Government intends to acquire a commercial item using FAR Part 12. Interested organizations may submit their capabilities and qualifications to perform the effort in writing to the identified point of contact not later than 4:30 p.m. local time on August 2, 2000. Such capabilities/qualifications will be evaluated solely for the purpose of determining whether or not to conduct this procurement on a competitive basis. A determination by the Government not to compete this proposed effort on a full and open competition basis, based upon responses to this notice is solely within the discretion of the government. Oral communications are acceptable in response to this notice. All responsible sources may submit an offer which shall be considered by the agency. An Ombudsman has been appointed. See NASA Specific Note "B". Any referenced notes can be viewed at the following URL: http://genesis.gsfc.nasa.gov/nasanote.html Posted 07/25/00 (D-SN478597). (0207)

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