59 -- ELECTRICAL AND ELECTRONIC EQUIPMENT COMPONENTS

Notice Date

January 11, 2001

Contracting Office

Bid Office, SPAWARSYSCEN, Code D21B, 53570 Silvergate Avenue, Bldg. A33, Room 0061, San Diego, CA 92152-5112

ZIP Code

92152-5112

Solicitation Number

N66001-01-Q-0401

Response Due

January 29, 2001

Point of Contact

Claudine Huggins: Purchasing Agent, 619-553-3755/Sylvia Proffit: Contracting Officer, 619-553-3292

Description

This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. The government intends to procure on a competitive basis for (1 ea) Recondition Mask Aligner. While price will be a significant factor in the evaluation on offers, the final contract award will be based on responsive, responsible, technically acceptable low offer. Competitive award may be based on the evaluation criteria stipulated in the Red, Yellow, Green (RYG) Contractor Evaluation System. SPECIFICATIONS: Reconditioned, 1x Magnification, 6 inch, Automatic Mask Aligner. The integrated circuit fabrication facility (ICFF) at SPAWAR Center San Diego (SSCSD) has a requirement for a reconditioned six-inch mask aligner that has a 1x magnification from photolithography mask to six-inch wafer. This mask aligner is intended to expose 1x magnification patterns from a 7 inch x 7 inch x .250 inch photo mask onto 150 millimeter semi standard silicon and silicon on insulator wafers coated with photo resist. WAFER HANDLING: The wafer handling shall be both six-inch and 150mm capable automated cassette-to-cassette handling. The mask size shall be 7 inch x 7 inches x -.250-inch Square. ILLUMINATION SYSTEM: The illumination system shall use a minimum 250w super high-pressure mercury lamp. This illumination system shall have demonstrated uniformity of at least plus or minus 3% across the six-inch or 150mm exposure area. This illumination system shall use a light integrator method for determining exposure time. ALIGMENT SYSTEM: This mask aligner shall be capable of fully automatic, semiautomatic, and manual mask to wafer alignment. Fully automatic and semi automatic alignment tolerance shall not exceed 0.5 microns. The alignment microscope shall be a split field system with a 10x objective lens and a 10x eyepiece. Additional 5x and 20x eyepieces are desired. The alignment microscope shall have a minimum of +10mm to -10mm scanning range. RESOLUTION AND DEPTH OF FOCUS: The optical system must be able to resolve a minimum of 1.0-micron feature size with a minimum depth of focus of +/- 1.0 micron. FOOTPRINT: System is normally located on a table, Body: 44" x 33" x 38", Wt 600lbs, Control Box: 13" x 28" x 20", Wt 75lbs, Lamp Supply: 6" x 12" x 12", Wt 15lbs. FACILITIES REQUIREMENTS: Power: 350VA or more (208 3phase), Pressure: 50-120 psi, CDA: 35-120 psi, N2: 45-120 psi, Vacuum 17.7" Hg or more. ACCEPTANCE CRITERIA: 1. System alignment and registration capability will be evaluated by acquiring alignment marks etched into 2200A Si02 and coated with 10,000 of positive photo resist on a 150mm silicon wafer. 2. Expose test wafer using a resolution/overlay test pattern on positive photo resist. An exposure/focus matrix will be used to determine best exposure does and focus settings. 3. Registration errors in the X and Y-axis using a venire type pattern is expected to be 500nm or less. 4. Resolution at or below 1.0um line/space is required. Interested parties are invited to respond to this synopsis. No RFQ is Available. Facsimile quotations are acceptable and must be received on or before COB on the closing date stated above. Facsimile quotation may be sent to (619)553-4842. Question may be directed to the Purchasing Agent responible for this action. NOTE: The full text of the FAR can be accessed at http://farsite.hill.af.mil/. Offeror must complete and submit with their quote copy of 52.219-1 Alt I/II, Small Business Program Representation. Central Contractor Registration is required for resulting award. Information may be found at http://www.ccr2000.com.

Record

Loren Data Corp. 20010116/59SOL005.HTM (W-011 SN50A704)